Primary Electron Beam Trajectory Evaluation for Accurate Multi-Beam Inspection

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Solution Overview

Problem

In electron beam observation devices, accurately irradiating a sample with a primary electron beam is crucial to avoid image overlap or omission, but existing systems struggle to evaluate and correct deviations in the primary electron beam trajectory effectively, which can lead to inspection inaccuracies.

Innovation Solution

A method and device for evaluating the deviation of the primary electron beam trajectory by acquiring images from both the primary and secondary optical systems, calculating deviation amounts, and using photoelectric converters to simulate secondary electron beams, allowing for precise adjustment of the primary electron beam path.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If a multiple beam generation mechanism is used to irradiate the sample with a primary electron beam including a plurality of primary electrons, then the throughput is improved, but the trajectory deviation of the primary electron beam causes image overlap or omission

Engineering Contradiction:
ImprovethroughputVSAvoidirradiation position accuracy
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent applies preliminary action by evaluating the trajectory of the primary electron beam before actual sample inspection. The system acquires images of the primary electron beam using photoelectric converters and calculates trajectory deviations in advance, allowing for pre-correction of beam positioning errors. This ensures that when multiple primary electrons irradiate the sample, their trajectories are already optimized to prevent image overlap or omission, thereby maintaining both high throughput and accurate irradiation positioning.

Inventive Principle:
Principle #10Preliminary action

2Device complexity

If the trajectory deviation of the primary electron beam is not evaluated, then the device complexity is reduced, but the inspection accuracy deteriorates due to image overlap or omission

Engineering Contradiction:
Improvesystem simplicityVSAvoidinspection accuracy
Core Design Contradiction:
Device complexityVSMeasurement precision

Solution Approach 1:

The patent introduces an intermediary evaluation system that acts as a mediator between the primary electron beam generation and the sample inspection processes. This intermediary system uses photoelectric converters to capture beam images, calculates trajectory deviations, and provides correction data without interfering with the main inspection workflow. The evaluation device serves as a bridge that enables accurate trajectory assessment while maintaining relative system simplicity through modular integration.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Measurement precision

If photosensitive film is used to evaluate the primary electron beam trajectory, then the measurement capability is improved, but the evaluation time and complexity increase

Engineering Contradiction:
Improvetrajectory evaluation capabilityVSAvoidevaluation time
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The patent replaces the mechanical/photochemical system of photosensitive film with an electronic detection system using photoelectric converters. Instead of using film that requires physical exposure, development, and analysis, the system employs electronic sensors that directly convert electron beam positions into digital signals for immediate processing. This substitution dramatically reduces evaluation time while maintaining or improving trajectory measurement precision through faster data acquisition and digital image processing capabilities.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables accurate evaluation and correction of primary electron beam deviations, ensuring precise irradiation and improving inspection accuracy by isolating and correcting primary optical system errors independently of secondary system deviations.

Implementation Method 1

irradiating with light a plurality of photoelectric converters each of which corresponding to each of the plurality of openings provided in the multiple beam generation mechanism and installed on a stage of the electron beam observation device, and acquiring a second image formed by an electron beam from the photoelectric converters

Methodology Applied
Scientific EffectPhotoelectric effect: Photoelectric Effect

Data Source

PatentUS20230393085A1Method of evaluating primary optical system of electron beam observation device, evaluation device used therefor, and method of manufacturing same
Publication Date: 2023.12.07 EBARA CORP
  • US20230393085A1 patent drawing
  • US20230393085A1 patent drawing
  • US20230393085A1 patent drawing

AI summary

Provided is a method of evaluating a deviation of a trajectory of a primary electron beam in a primary optical system in an electron beam observation device including the primary optical system that irradiates a sample with the primary electron beam including a plurality of primary electrons and a secondary optical system that detects, by a detector, a secondary electron beam including a plurality of secondary electrons emitted from the sample irradiated with the primary electron beam.