Electron Beam Characterization by X-Ray Profiling in Grounded Beam Dumps

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Solution Overview

Problem

Existing methods for determining and controlling the electron beam spot size and shape in liquid metal jet X-ray sources face challenges such as short-circuits and image distortions due to the need for electrical isolation of the electron beam dump, which complicates the measurement process.

Innovation Solution

Characterizing the electron beam by measuring X-ray radiation generated during scanning, allowing the electron beam dump to be electrically grounded and eliminating the risk of short-circuits, while using the liquid metal jet or other obscuring objects to determine the beam's width and other characteristics through X-ray profiles.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If the electron beam dump is electrically isolated to enable current measurement, then the beam width can be determined, but short-circuits and arcing occur at the sensor edges

Engineering Contradiction:
Improvebeam width measurementVSAvoidelectrical stability
Core Design Contradiction:
Measurement precisionVSReliability

Solution Approach 1:

The patent replaces the electrical measurement system (current measurement through charge-sensitive sensor) with an optical measurement system (X-ray intensity measurement). By measuring the X-ray radiation intensity as the electron beam is scanned across the liquid metal jet target, the beam width can be determined without requiring electrical isolation or current measurement, thereby eliminating short-circuit and arcing issues while maintaining measurement precision

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent introduces an intermediary measurement approach using X-ray radiation as a mediator between the electron beam and the measurement system. Instead of directly measuring electrical current at the beam dump, the system measures X-ray intensity generated by electron-target interaction, which provides indirect but accurate beam width information without electrical contact issues

Inventive Principle:
Principle #24Intermediary (Mediator)

2Measurement precision

If the sensor area is partially obscured by the electron target to measure beam width, then the beam width can be derived from the transition width, but the sensor area cannot be electrically grounded

Engineering Contradiction:
Improvebeam width determinationVSAvoidelectrical isolation requirement
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent replaces the complex electrical measurement system requiring isolated sensor areas with a simplified optical measurement system. By scanning the electron beam across the liquid metal jet target and measuring X-ray intensity variations, beam width is determined through the transition region without any electrical isolation requirements, significantly reducing device complexity

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

Instead of obscuring the sensor to measure beam properties (as in prior art), the patent inverts the approach by using the target material itself to generate measurable X-ray radiation. The beam width is determined by measuring X-ray intensity as the beam scans across the target, reversing the measurement paradigm from sensor-based to target-based measurement

Inventive Principle:
Principle #13The other way round (Inversion)

3Measurement precision

If material droplets are deposited on the electron beam dump surface, then image distortions occur, but electrical isolation is required to prevent short-circuits

Engineering Contradiction:
Improveimage qualityVSAvoidelectrical stability
Core Design Contradiction:
Measurement precisionVSReliability

Solution Approach 1:

The patent replaces electrical current measurement with optical X-ray intensity measurement. Since the measurement is based on X-ray radiation rather than electrical current, the beam dump can be electrically grounded without risk of short-circuits from deposited droplets, eliminating the trade-off between image quality and electrical stability

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent converts the potentially harmful effect of droplet deposition into a beneficial one. Deposited material on the grounded beam dump either remains transparent to X-rays or acts as an additional X-ray source, both of which do not interfere with the measurement and may even enhance the X-ray signal, while the grounding prevents electrical issues

Inventive Principle:
Principle #22Blessing in disguise (Convert harm into benefit)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method effectively determines the electron beam's characteristics without electrical isolation issues, reducing short-circuits and image distortions, and provides accurate measurements of the beam's width and intensity profile, enhancing the control and brilliance of X-ray generation.

Implementation Method 1

X-ray radiation may be generated by letting an electron beam impact upon a target material. The X-ray radiation may be generated as Bremsstrahlung or characteristic line emission from the target material.

Methodology Applied
Scientific EffectBremsstrahlung:

Implementation Method 2

X-ray radiation may be generated by letting an electron beam impact upon a target material. The X-ray radiation may be generated as Bremsstrahlung or characteristic line emission from the target material.

Methodology Applied
Scientific EffectCharacteristic line emission:

Data Source

PatentUS11892576B2Characterization of an electron beam
Publication Date: 2024.02.06 EXCILLUM
  • US11892576B2 patent drawing
  • US11892576B2 patent drawing
  • US11892576B2 patent drawing

AI summary

A method for characterizing an electron beam in a liquid metal jet X-ray source. The method includes providing the electron beam and directing the electron beam to an interaction region; providing an electron beam dump connected to ground potential for receiving the electron beam after it has traversed the interaction region; scanning the electron beam over at least part of the interaction region; measuring X-ray radiation generated by interaction between the electron beam and the electron beam dump during the scanning to obtain an X-ray profile; and calculating an electron beam characteristic based on the X-ray profile. Also, a corresponding liquid metal jet X-ray source.