Electron Dose Waveform Control for Dynamic Electron Microscopy

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Solution Overview

Problem

Current transmission electron microscopy (TEM) techniques face challenges in modulating the electron dose on a fast timescale and synchronizing it with the dynamics of the sample, leading to potential sample damage and image quality issues due to the limitations of existing electron optical settings and pulsed electron sources.

Innovation Solution

A system comprising an electron source, a detector, and a deflector that modulates the electron dose waveform with a continuously variable temporal profile, allowing for arbitrary waveform definitions, non-uniform pulse widths, and repetition rates, synchronized with the sample's characteristics and the microscope's conditions, using computer processors and pattern generators to adjust the electron dose dynamically.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Speed

If electron optical settings (beam current, convergence angle, aperture size) are adjusted to modulate electron dose, then the electron dose can be controlled, but the modulation cannot occur on a fast timescale and requires complex alignment of multiple interconnected parameters

Engineering Contradiction:
Improveelectron dose modulation speedVSAvoidelectron optical system complexity
Core Design Contradiction:
SpeedVSDevice complexity

Solution Approach 1:

The patent extracts the electron dose modulation function from the complex electron optical system by introducing a separate deflector component. This deflector modulates the electron beam intensity independently of the electron optical settings, allowing fast dose modulation without requiring complex alignment of multiple optical parameters. The deflector acts as an independent module that separates the modulation function from the imaging optics.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The deflector serves as an intermediary component between the electron source and the sample. It mediates the electron beam by rapidly modulating its intensity according to a desired temporal profile, enabling fast dose control without directly adjusting the electron optical settings. This intermediary approach allows independent control of dose timing and intensity.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Adaptability or versatility

If conventional pulsed electron sources (laser-driven cathodes, radio-frequency pulsers) are used to modulate electron dose, then the dose can be pulsed, but the waveform is limited by physical constraints such as limited dynamic range and duration

Engineering Contradiction:
Improveelectron dose waveform flexibilityVSAvoidwaveform consistency
Core Design Contradiction:
Adaptability or versatilityVSReliability

Solution Approach 1:

The patent implements dynamic electron dose modulation by using a deflector that can rapidly change the electron beam intensity according to an arbitrary temporal profile. Unlike conventional pulsed sources with fixed parameters, this system allows the waveform characteristics (pulse width, repetition rate, amplitude) to be dynamically adjusted in real-time, providing high adaptability while maintaining consistent delivery through precise electronic control.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The system changes the temporal parameters of the electron dose waveform dynamically by controlling the deflector with programmable signals. The pulse width, repetition rate, and amplitude can be independently adjusted to match the specific dynamics of the sample being studied, providing versatile waveform control without being constrained by the physical limitations of laser-driven or radio-frequency pulsing mechanisms.

Inventive Principle:
Principle #35Parameter changes

3Measurement precision

If the electron dose is increased to improve image quality and signal strength, then better measurement precision is achieved, but sample damage increases

Engineering Contradiction:
Improveimage qualityVSAvoidsample damage
Core Design Contradiction:
Measurement precisionVSObject-affected harmful factors

Solution Approach 1:

The patent applies periodic or pulsed electron dosing instead of continuous illumination. The electron beam is delivered in controlled pulses with adjustable timing and duration, allowing the sample to partially relax or reset between pulses. This periodic action reduces cumulative damage while maintaining sufficient signal strength for high-quality imaging by concentrating the dose in brief, intense bursts followed by recovery periods.

Inventive Principle:
Principle #19Periodic action

Solution Approach 2:

The system uses ultrafast electron pulses that deliver the necessary dose in extremely brief time intervals, essentially 'rushing through' the sample before damage can accumulate. By concentrating the electron dose into sub-microsecond or nanosecond pulses, the measurement is completed faster than the timescale of many damage mechanisms, achieving high image quality with minimal sample degradation.

Inventive Principle:
Principle #21Skipping (Rushing through)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables precise and repeatable adjustment of the electron dose to match the sample's dynamics, reducing damage and improving image quality by allowing for fast, continuous modulation of the electron dose across a wide range, from 0 to 100% dose transmission, and synchronization with detector signals and electron-optical conditions.

Implementation Method 1

a deflector positioned between the electron source and the sample, wherein the deflector modulates an intensity of the electron source directed to the sample area according to an electron dose waveform

Methodology Applied
Scientific EffectElectron beam deflection: Lorentz Force

Data Source

PatentUS12080514B2Arbitrary electron dose waveforms for electron microscopy
Publication Date: 2024.09.03 INTEGRATED DYNAMIC ELECTRON SOLUTIONS INC
  • US12080514B2 patent drawing
  • US12080514B2 patent drawing
  • US12080514B2 patent drawing

AI summary

A device may include an electron source, a detector, and a deflector. The electron source may be directed toward a sample area. The detector may receive an electron signal or an electron-induced signal. A deflector may be positioned between the electron source and the sample. The deflector may modulate an intensity of the electron source directed to the sample area according to an electron dose waveform having a continuously variable temporal profile.