Electron Gun Tip Sublimation Control via Segmented Emission Layer

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Solution Overview

Problem

Existing electron beam exposure apparatuses face issues with the sublimation of the electron gun tip, leading to unstable electron beam emission and reduced throughput due to changes in the electron emission surface shape, which affects line width precision and exposure reliability.

Innovation Solution

An electron gun design incorporating an electron source with a suppressor electrode and an electron beam converging unit using a magnetic or electrostatic lens to minimize sublimation by maintaining the electron source at a low temperature and controlling the electron beam convergence, thereby reducing the emission angle and preventing micro-discharge.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the electron source is heated to a high temperature to emit electrons, then electron emission is achieved, but the tip material sublimates and the emission surface shape changes

Engineering Contradiction:
Improveelectron emission stabilityVSAvoidtip shape stability
Core Design Contradiction:
ReliabilityVSStability of the object's composition

Solution Approach 1:

The tip is divided into two functional layers: an electron emission layer (LaB6 or CeB6) that emits electrons when heated, and a base layer (W or Re) that provides structural stability and resists sublimation. This segmentation allows the emission layer to perform its function while the base layer maintains tip shape stability.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The tip uses a composite structure combining LaB6/CeB6 emission material with W/Re base material. The composite material properties enable both effective electron emission and resistance to sublimation-induced shape change, resolving the contradiction between emission performance and structural stability.

Inventive Principle:
Principle #40Composite materials

2Manufacturing precision

If the electron beam emission angle is reduced to improve line width precision, then manufacturing precision improves, but electron beam convergence becomes more difficult

Engineering Contradiction:
Improveline width precisionVSAvoidbeam convergence system complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent introduces a magnetic field dimension to control electron beam convergence. By applying a magnetic field in the vertical direction (perpendicular to the beam propagation), the electrons are forced to follow curved trajectories, achieving beam convergence and small emission angles without complicating the horizontal beam path geometry.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution extends the operational period of the electron gun, maintains stable electron beam emission, and enhances throughput by preventing sublimation and maintaining uniform beam irradiation, ensuring high reliability and precision in pattern writing.

Implementation Method 1

an electron source for emitting electrons; an electron beam converging unit for converging an electron beam of thermal field emission electrons

Methodology Applied
Scientific EffectThermal field emission: Thermionic Emission

Implementation Method 2

an electron beam converging unit using a magnetic or electrostatic lens to minimize sublimation

Methodology Applied
Scientific EffectMagnetic field convergence: Magnetic Field

Implementation Method 3

an electron beam converging unit using a magnetic or electrostatic lens to minimize sublimation

Methodology Applied
Scientific EffectElectrostatic lens: Electrostatic Lens

Data Source

PatentUS8330344B2Electron gun minimizing sublimation of electron source and electron beam exposure apparatus using the same
Publication Date: 2012.12.11 ADVANTEST CORP
  • US8330344B2 patent drawing
  • US8330344B2 patent drawing
  • US8330344B2 patent drawing

AI summary

An electron gun includes: an electron source; an accelerating electrode; an extraction electrode for extracting electrons from an electron emission surface of the electron source; a suppressor electrode for suppressing emission of electrons from a side surface of the electron source; and an electron beam converging unit for converging an electron beam of thermal field emission electrons emitted from the electron emission surface by applying an electric field to the electron emission surface. The electron beam converging unit is an electrostatic lens electrode which is placed between the extraction electrode and the accelerating electrode and having an opening portion in its center. A voltage is applied to the electrostatic lens electrode to converge the electron beam.