Electron Lens in Wien Filter for Chromatic Aberration Control

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Conventional Wien filters do not effectively reduce axial chromatic aberrations, which limits the improvement of electron beam resolution despite efforts to reduce energy distribution.

Innovation Solution

Incorporating an electron lens between the beam slit and a pair of superimposed magnetic and electrostatic deflectors, with the electron lens being a magnetic or accelerating electrostatic lens, and aligning the electron beam to pass through its center, while using a slit movement mechanism for precise alignment, helps to suppress axial chromatic aberrations and enhance deflection chromatic aberration generation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If an electron lens is added between the beam slit and deflector pair, then axial chromatic aberrations are suppressed, but device complexity increases

Engineering Contradiction:
Improveaxial chromatic aberrationsVSAvoiddevice complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The electron lens is designed to perform multiple functions: it focuses the electron beam, compensates for axial chromatic aberrations, and maintains proper beam alignment through the Wien filter. This multi-functionality justifies the added complexity by delivering multiple benefits from a single component.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration reduces energy distribution while minimizing axial chromatic aberrations, thereby improving the resolution of the electron beam by up to 27% compared to systems without this setup.

Implementation Method 1

a magnetic deflector and an electrostatic deflector that are superimposed with each other

Methodology Applied
Scientific EffectMagnetic field: Magnetic Field

Implementation Method 2

a magnetic deflector and an electrostatic deflector that are superimposed with each other

Methodology Applied
Scientific EffectElectric field: Electric Field

Implementation Method 3

As the electron lens, a magnetic lens or an accelerating electrostatic lens is preferably used

Methodology Applied
Scientific EffectMagnetic lens:

Implementation Method 4

an accelerating electrostatic lens is preferably used

Methodology Applied
Scientific EffectElectrostatic lens: Electrostatic Lens

Data Source

PatentUS9543053B2Electron beam equipment
Publication Date: 2017.01.10 HITACHI HIGH TECH CORP
  • US9543053B2 patent drawing
  • US9543053B2 patent drawing
  • US9543053B2 patent drawing

AI summary

To improve the efficiency of generation of chromatic aberrations of an energy filter for reducing energy distribution. Mounted are an energy filter for primary electrons, the energy filter having a beam slit and a pair of a magnetic deflector and an electrostatic deflector that are superimposed with each other. An electron lens is arranged between the beam slit and the pair of the magnetic deflector and the electrostatic deflector.