Electron Microscope Defocus Spread Measurement via Diffractogram Anisotropy

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Current methods for determining the defocus spread and limiting resolution of electron microscopes are subjective and prone to significant errors, as they rely on qualitative assessments and are influenced by detector amplification and scaling, leading to inaccuracies in evaluating diffractograms from thin amorphous objects.

Innovation Solution

An electron microscope with a tilting beam and an evaluation unit that analyzes the anisotropy of diffractogram intensity distributions to quantify defocus spread and focus distribution, using mathematical models to determine the limiting resolution, which is independent of assumed Gaussian distributions and aberrations.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Illumination intensity

If the traditional Young's fringe method is used to determine limiting resolution, then the visibility of line patterns can be improved, but the measurement precision deteriorates due to subjective assessment and detector amplification properties

Engineering Contradiction:
Improvevisibility of line patternVSAvoidlimiting resolution determination accuracy
Core Design Contradiction:
Illumination intensityVSMeasurement precision

Solution Approach 1:

The patent replaces the subjective visual assessment method with an automated image processing and mathematical analysis system. The evaluation unit performs objective calculations on diffractogram intensity distributions, substituting human observer judgment with computational algorithms that calculate limiting resolution based on measured intensity decay characteristics.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent introduces an evaluation unit as an intermediary between the diffractogram acquisition and the limiting resolution determination. This intermediary component processes the raw diffractogram data through standardized algorithms, eliminating the direct subjective assessment while maintaining the relationship between observed patterns and resolution metrics.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Ease of operation

If qualitative visibility criteria are used to assess line patterns, then the ease of operation is improved, but the measurement precision deteriorates due to large evaluation errors

Engineering Contradiction:
Improvesimplicity of assessmentVSAvoidlimiting resolution accuracy
Core Design Contradiction:
Ease of operationVSMeasurement precision

Solution Approach 1:

The patent replaces manual qualitative assessment with automated computational analysis. The evaluation unit calculates limiting resolution objectively using mathematical relationships between diffractogram intensity distributions and resolution parameters, eliminating observer-dependent judgment while maintaining operational simplicity through automated processing.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The system performs self-assessment through automated algorithms that independently analyze diffractogram patterns and calculate limiting resolution without human intervention. The evaluation unit processes the data through standardized mathematical procedures, making the system self-sufficient and eliminating subjective variability.

Inventive Principle:
Principle #25Self-service

3Device complexity

If non-linear contrast fractions are present in the diffractogram, then the complexity of the imaging process is increased, but the measurement precision deteriorates due to simulated limiting resolution errors

Engineering Contradiction:
Improveimaging process complexityVSAvoidlimiting resolution determination accuracy
Core Design Contradiction:
Device complexityVSMeasurement precision

Solution Approach 1:

The patent extracts and separates the effects of non-linear contrast from the overall intensity distribution analysis. By focusing on specific characteristics of the diffractogram that are less sensitive to non-linear contrast effects, the method isolates the relevant information for limiting resolution determination while minimizing the influence of contrasting artifacts.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent applies a partial analysis approach, focusing on specific aspects of the diffractogram intensity distribution that are most relevant to limiting resolution. Rather than attempting to correct all sources of error, the method targets the specific relationship between intensity decay and resolution, accepting certain limitations while achieving sufficient accuracy for practical purposes.

Inventive Principle:
Principle #16Partial or excessive action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach allows for precise, objective determination of the limiting resolution, reducing systematic errors and improving accuracy by directly measuring defocus spread and focus distribution, even in the presence of aberrations, thereby enhancing the reliability of electron microscope imaging.

Implementation Method 1

The radiation reflected by the object, or transmitted through the object, or secondary electrons emitted by the object, are focused to form a magnified picture of the object by means of electromagnetic lenses

Methodology Applied
Scientific EffectElectromagnetic lens focusing: Electromagnet

Implementation Method 2

A diffractogram is an optically or digitally produced Fourier transform of an electron-optical image

Methodology Applied
Scientific EffectElectron diffraction: Diffraction

Implementation Method 3

A diffractogram is an optically or digitally produced Fourier transform of an electron-optical image

Methodology Applied
Scientific EffectFourier transform:

Data Source

PatentUS9076630B2Electron microscope and a method for measuring the defocus variation or the limit resolution
Publication Date: 2015.07.07 FORSCHUNGSZENTRUM JULICH GMBH
  • US9076630B2 patent drawing
  • US9076630B2 patent drawing
  • US9076630B2 patent drawing

AI summary

An electron microscope and a method for measuring the defocus spread or the limiting resolution of an electron microscope takes advantage of the fact that, in the case of tilted illumination, any aberration that may be present and the defocus spread of the electron microscope anisotropically change the intensity distribution in the diffractogram. In particular, the envelope of the diffractogram is anisotropically narrowed. If both the tilt of the electron beam and any aberration that may be present are known, and the focus distribution is assumed to be Gaussian-shaped, the defocus spread of the electron microscope is the only parameter still unknown that influences the anisotropic changes in intensity distribution. Quantitative conclusions as to the defocus spread can thus be drawn from the changes. However, the focus distribution can also be determined from the anisotropic narrowing without the use of a model, and without a priori assumptions about the shape thereof. In this way, the limiting resolution of the electron microscope can be determined.