Electron Microscope Focused Ion Beam Interior Crystal Orientation Mapping
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Solution Overview
Problem
Conventional electron microscopes find it difficult to acquire crystal orientation information of a specimen's interior, as they primarily focus on surface information and struggle to effectively measure internal structures.
Innovation Solution
An electron microscope equipped with an electron beam column, a focused ion beam column, and a scattered electron detector that allows for in-situ processing and measurement of sections within the specimen, enabling the detection of backscattered electrons and Kikuchi patterns to obtain crystal orientation information from the specimen interior without moving the specimen.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional electron microscopes are used to detect backscattered electrons, then surface crystal orientation information can be obtained, but interior crystal orientation information cannot be acquired
Solution Approach 1:
The patent combines a focused ion beam column with an electron beam column and backscattered electron detector within the same vacuum chamber. The focused ion beam is used to form cross-sections or expose interior regions of the specimen, while the electron beam and detector simultaneously perform EBSP measurement on these interior regions, enabling crystal orientation analysis at multiple depths without moving the specimen.
Solution Approach 2:
The patent transitions from surface-only measurement to three-dimensional interior measurement by using the focused ion beam to create cross-sectional views at different depths. This allows EBSP measurement to be performed on interior regions along the depth dimension, transforming the measurement capability from two-dimensional surface analysis to three-dimensional volumetric analysis.
2Adaptability or versatility
If the specimen is moved between processing and measurement, then different regions can be analyzed, but measurement efficiency decreases
Solution Approach 1:
The patent merges the focused ion beam processing function with the electron beam measurement function in the same vacuum chamber. The specimen remains stationary on the specimen stage while the focused ion beam processes specific regions and the electron beam simultaneously or sequentially measures those same regions, eliminating the need to move the specimen between processing and measurement steps.
Solution Approach 2:
The patent uses the vacuum chamber as an intermediary environment that accommodates both the focused ion beam column and the electron beam column with their detector. This common environment allows both processing and measurement operations to be performed on the same specimen regions without exposure to atmospheric conditions, maintaining measurement efficiency.
3Adaptability or versatility
If the scattered electron detector is positioned at angles other than 60-150 degrees relative to the electron beam, then detection geometry changes, but backscattered electron detection efficiency decreases
Solution Approach 1:
The patent optimizes the detection angle parameter by positioning the scattered electron detector at 60-150 degrees relative to the electron beam direction. This specific angular range maximizes the detection efficiency of backscattered electrons while maintaining the ability to obtain high-quality Kikuchi patterns for crystal orientation analysis.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration allows for efficient acquisition of crystal orientation information from the specimen interior by processing and measuring sections without moving the specimen, enabling three-dimensional crystal orientation mapping and transmission electron imaging.
Implementation Method 1
an electron beam column for irradiating a specimen with an electron beam
Implementation Method 2
detect backscattered electrons that are released from the specimen
Implementation Method 3
a focused ion beam column for irradiating the specimen with a focused ion beam and forming a section
Implementation Method 4
irradiating the specimen with a focused ion beam and forming a section
Implementation Method 5
a scattered electron detector for detecting backscattered electrons produced from the section by irradiation with the electron beam
Implementation Method 6
The scattered electron detector of the electron microscope detects a Kikuchi pattern of the backscattered electrons
Data Source
AI summary
An electron microscope has a focused ion beam column positioned relative to an electron beam column so that the focused ion beam substantially perpendicularly intersects the electron beam. A backscattered electron detector is positioned relative to the focused ion beam column so that the direction normal to a detection plane of the backscattered electron detector is substantially perpendicular to the direction of the focused ion beam. The backscattered electron detector is configured and positioned to detect backscattered electrons released in a spread of at least about 70 degrees in width from the surface of the section by irradiation of the section with the electron beam 1a.