Electron Microscope Imaging With Low-Dose Trajectory Analysis

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Existing electron microscopy techniques require high electron irradiation doses to achieve clear images, leading to specimen damage, especially in sensitive materials like high polymers and biological specimens.

Innovation Solution

An electron microscope analysis system that uses a spinning linear matter wave (de Broglie wave) model to represent electrons, allowing for electron detection as detection points rather than existence probabilities, enabling image comparison and analysis with minimal electron irradiation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If high electron irradiation dose is used to obtain clear electron microscope images, then image quality and information accuracy are improved, but specimen damage increases

Engineering Contradiction:
Improveimage qualityVSAvoidspecimen damage
Core Design Contradiction:
Measurement precisionVSObject-affected harmful factors

Solution Approach 1:

The patent creates a simulation image that copies the essential features of the actual electron microscope image through trajectory calculation. This simulation serves as a substitute that requires minimal electron irradiation, thereby reducing specimen damage while still providing comparable analytical information for structure interpretation.

Inventive Principle:
Principle #26Copying

Solution Approach 2:

The patent performs preliminary trajectory calculation and simulation image generation before actual electron microscope observation. By pre-calculating expected images based on assumed structures and comparing them with actual observations, the method reduces the need for high-dose irradiation during actual imaging, thus protecting sensitive specimens.

Inventive Principle:
Principle #10Preliminary action

2Device complexity

If high magnification transmission image is obtained by plane wave approximation, then image formation is simplified, but electron detection accuracy deteriorates

Engineering Contradiction:
Improveimage formation complexityVSAvoidelectron detection accuracy
Core Design Contradiction:
Device complexityVSMeasurement precision

Solution Approach 1:

The patent replaces the conventional plane wave approximation method with a trajectory calculation approach that treats electrons as particles with specific paths. This substitution maintains computational feasibility while improving accuracy by calculating individual electron trajectories through the specimen rather than using simplified wave approximations.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the fundamental parameter representation from plane wave functions to individual electron trajectories with specific incident angles and paths. This parameter transformation allows for more accurate modeling of electron-specimen interactions while maintaining computational tractability through statistical sampling of trajectories.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Reduces specimen damage by electron beams while allowing accurate specimen information acquisition with reduced electron dosage.

Implementation Method 1

the interference image or the electron diffraction pattern between the wave motion subjected to phase modulation by the interaction with the electromagnetic field created by the material structure

Methodology Applied
Scientific EffectElectromagnetic interaction: Electromagnetic Induction

Implementation Method 2

the experiment that has been performed so far for the interference of the electron beam proves that the detection point of each electron is accumulated on the detection plane to form the interference image

Methodology Applied
Scientific EffectWave-particle duality: Interference

Implementation Method 3

the electron emitted from the electron source (electron gun) is controlled in its trajectory by the electrostatic lens and the magnetic field lens of the irradiation system

Methodology Applied
Scientific EffectElectrostatic lens effect: Electrostatic Lens

Implementation Method 4

the electron emitted from the electron source (electron gun) is controlled in its trajectory by the electrostatic lens and the magnetic field lens of the irradiation system

Methodology Applied
Scientific EffectMagnetic field effect: Magnetic Field

Data Source

PatentUS12463007B2Electron microscope analysis system
Publication Date: 2025.11.04 RIKEN CO LTD
  • US12463007B2 patent drawing
  • US12463007B2 patent drawing
  • US12463007B2 patent drawing

AI summary

An electron microscope analysis system includes a detector that captures an electron microscope image formed on a detection plane by an electron beam that irradiates a specimen to be observed and transmits through the specimen. Electrons each having a de Broglie wave motion are integrated to be a linear rotor that is a collection of the electrons each having the de Broglie wave motion, so that each electron can be recognized, the principle of conservation of electric charge can be satisfied, and interaction with the specimen can be calculated. The electron is represented as a detection point on the detection plane, for comparison with actual measurement data when the number of electrons is small, to reduce damage of the specimen by the electron beam, and to obtain information of the specimen when an amount of irradiation is small.