Electron Microscope Specimen Tilt Adjustment via Diffraction Analysis
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Solution Overview
Problem
Current methods for adjusting the specimen tilt angle in electron microscopes are often manual, time-consuming, and lack versatility, particularly for inexperienced operators, and may cause measurement errors due to misalignment of the electron beam with the crystal orientation of the specimen.
Innovation Solution
An electron microscope system that includes an irradiation lens system, an irradiation system deflector, a specimen tilting mechanism, an imaging lens system, and a controller that acquires multiple electron diffraction patterns with different incidence angles, calculates the optimal tilt angle, and automatically adjusts the specimen to align the electron beam with the crystal orientation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If manual adjustment of specimen tilt angle is performed, then adjustment speed depends on operator skill, but inexperienced operators require considerable time and may cause measurement errors
Solution Approach 1:
The patent replaces the manual mechanical adjustment system with an automatic control system that uses electron diffraction pattern recognition and computational algorithms to determine and apply the correct specimen tilt angle, eliminating dependence on operator skill and experience
Solution Approach 2:
The system performs self-adjustment by automatically acquiring electron diffraction patterns, calculating the optimal tilt angle through pattern analysis, and controlling the specimen stage to achieve proper alignment without requiring operator intervention or expertise
2Reliability
If specimen is mechanically tilted to acquire electron diffraction pattern at each tilt angle, then comprehensive data is obtained, but adjustment time becomes considerable
Solution Approach 1:
The system acquires electron diffraction patterns at a limited set of tilt angles rather than continuously scanning all possible angles, obtaining sufficient data for accurate orientation determination while significantly reducing the time required compared to exhaustive mechanical tilting
Solution Approach 2:
The patent replaces extensive mechanical tilting operations with a computational approach that analyzes electron diffraction patterns acquired at fewer tilt angles, using algorithms to calculate the precise crystal orientation and required specimen tilt angle from the partial data set
3Extent of automation
If automatic adjustment method requiring material registration is used, then computation can be performed, but versatility is reduced for unregistered materials
Solution Approach 1:
The system employs a universal automatic adjustment method that can handle any crystalline material without requiring pre-registration of material-specific parameters, using general electron diffraction pattern analysis algorithms that adapt to different crystal structures and orientations
Solution Approach 2:
The patent extracts and eliminates the material registration requirement from the automatic adjustment process, relying solely on electron diffraction pattern analysis to determine crystal orientation and calculate the optimal specimen tilt angle, making the system applicable to any crystalline material
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables rapid and accurate automatic adjustment of the specimen tilt angle, reducing the risk of measurement errors and damage to imaging devices, and allows for the handling of various crystalline specimens without prior material registration.
Implementation Method 1
an irradiation lens system that irradiates a specimen with an electron beam
Implementation Method 2
an imaging lens system that forms an electron diffraction pattern or an electron microscope image by using an electron having passed through the specimen
Data Source
AI summary
An electron microscope includes: an irradiation lens system that irradiates a specimen with an electron beam; an irradiation system deflector that deflects an electron beam incident on the specimen; a specimen tilting mechanism that tilts the specimen; an imaging lens system that forms an electron diffraction pattern or an electron microscope image by using an electron having passed through the specimen; an imaging device that acquires the electron diffraction pattern or the electron microscope image formed by the imaging lens system; and a controller that controls the irradiation system deflector and the specimen tilting mechanism. The controller performs: a process of acquiring a plurality of electron diffraction patters formed by using electron beams having different incidence angles to the specimen, the different incidence angles having been obtained by deflecting the electron beams incident on the specimen by using the irradiation system deflector; a process of calculating a tilt angle of the specimen based on the plurality of electron diffraction patterns; and a process of controlling the specimen tilting mechanism so that the specimen has the calculated tilt angle.