Electronic Device Spacer Width for Alignment Film Protection
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Solution Overview
Problem
Existing electronic devices face challenges in achieving high resolution and process yield due to issues such as alignment film scratching, alignment film halo, and poor alignment around spacers, particularly in liquid crystal display devices.
Innovation Solution
The electronic device incorporates a spacer with a specific width relationship to the sub-pixel pitch, utilizing a first pattern and a second pattern to maintain cell gap stability and reduce the risk of alignment film damage, thereby improving manufacturing efficiency and reducing light leakage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the spacer width is reduced to improve resolution, then the sub-pixel pitch can be decreased, but the alignment film is more susceptible to scratching and alignment errors
Solution Approach 1:
The patent introduces a first pattern as an intermediary structure between the data line and the spacer. This first pattern serves as a protective mediator that prevents the spacer from directly contacting and scratching the alignment film, while still maintaining the necessary spacing and alignment functions. The first pattern acts as a buffer zone that resolves the conflict between reducing spacer width for higher resolution and preventing alignment film damage.
2Object-generated harmful factors
If the spacer width is decreased to reduce light leakage, then the cell gap can be controlled better, but the manufacturing precision deteriorates due to alignment issues
Solution Approach 1:
The patent applies preliminary action by forming the first pattern before positioning the spacer. The first pattern is pre-formed on the data line structure, establishing a predetermined reference geometry that guides subsequent spacer placement. This preliminary structure ensures that even when the spacer width is reduced to minimize light leakage, the alignment process has a built-in reference that maintains manufacturing precision.
Solution Approach 2:
The first pattern serves as an intermediary reference structure that mediates between the data line and the spacer. It provides a stable geometric reference that ensures accurate alignment during manufacturing, while allowing the spacer width to be optimized for light leakage control. The first pattern decouples the alignment function from the spacing function, enabling independent optimization of both parameters.
3Stability of the object's composition
If the spacer width is increased to improve alignment stability, then the cell gap can be maintained, but the resolution deteriorates due to larger pixel areas
Solution Approach 1:
The patent segments the spacing function into two distinct components: the first pattern that provides alignment reference and the spacer that provides physical spacing. This segmentation allows the spacer width to be minimized for higher resolution while the first pattern maintains the necessary alignment stability and cell gap control through its predetermined geometric relationship with the data line and substrate.
4Reliability
If the alignment film is made more protective to prevent scratching, then the reliability improves, but the manufacturing process becomes more complex
Solution Approach 1:
The first pattern serves as a simple intermediary structure that provides protection to the alignment film without adding complex manufacturing steps. It is formed as a basic pattern on the data line using standard photolithography and etching processes, creating a protective buffer zone that prevents spacer contact with the alignment film. This approach improves reliability while maintaining manufacturing simplicity.
Data Source
AI summary
An electronic device has a plurality of sub-pixels. The electronic device includes a substrate, a gate line and a spacer. The gate line is disposed on the substrate and extends along a first direction. The spacer is disposed on the gate line and overlaps with the gate line. The spacer has a first width W1 along the first direction. One of the plurality of sub-pixels has a sub-pixel pitch P along the first direction. The first width W1 and the sub-pixel pitch P satisfy the following relationship: P≤W1.