Electronic Sight Photomask Low-Reflective Layer
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Solution Overview
Problem
Electronic sights suffer from metallic reflections caused by the photomask's reflective layer, which interfere with the shooter's vision by reflecting light back and obscuring the aiming mark.
Innovation Solution
A low-reflective layer is formed on the photomask using materials like Fe—Ni—Cr or SiO2, applied via thermal evaporation, to reduce reflectance below 45% (preferably under 20%), preventing metallic reflections from interfering with the aiming mark.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a photomask is used to block unnecessary light, then the aiming mark visibility is improved, but metallic reflections are generated that interfere with shooter's vision
Solution Approach 1:
A low-reflective layer is introduced as an intermediary between the photomask and the optical window. This layer mediates the interaction by reducing the reflectivity of the photomask surface, thereby eliminating harmful metallic reflections while preserving the photomask's light-blocking function. The low-reflective layer acts as a buffer that transforms the reflective surface into a non-reflective one.
Solution Approach 2:
The reflectivity parameter of the photomask is changed by coating it with a low-reflective layer. This parameter change transforms the photomask from a highly reflective metallic surface to a low-reflectivity surface, reducing reflections to below 45% (preferably under 20%). This parameter modification resolves the contradiction by maintaining light-blocking capability while eliminating harmful reflections.
2Object-generated harmful factors
If a low-reflective layer is formed on the photomask, then metallic reflections are reduced, but the manufacturing process becomes more complex
Solution Approach 1:
The manufacturing process utilizes physical vapor deposition (PVD) to deposit a thin low-reflective layer on the photomask. This is a成熟 and widely used coating technology that adds minimal complexity to the manufacturing process. The layer thickness is controlled at the nanometer scale (e.g., 50-200 nm), which can be achieved using standard coating equipment without requiring complex multi-step processes.
Solution Approach 2:
The photomask is transformed into a composite structure by combining the metallic photomask base with a low-reflective coating layer. This composite structure maintains the functional properties of the metal (light blocking, structural integrity) while adding the optical property of low reflectivity through the coating. The composite approach allows simple integration of the low-reflective property without fundamentally redesigning the manufacturing process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The low-reflective layer effectively blocks metallic reflections, enhancing the shooter's visibility of the aiming mark by minimizing unwanted light reflections, thereby improving the clarity and usability of the electronic sight.
Implementation Method 1
A low-reflective layer is formed on the photomask using materials like Fe—Ni—Cr or SiO2, applied via thermal evaporation
Implementation Method 2
the lightbeam passes through the photomask along a first direction, hits the optical window, and is reflected toward a second direction by the optical window
Data Source
AI summary
The electronic sight includes a base, an optical window, a point light source, a photomask and a low-reflective layer. The optical window is disposed on a first end of the base. The point light source, disposed on a second end of the base, provides a lightbeam. The photomask is disposed between the point light source and the optical window, and the low-reflective layer is formed thereon. The lightbeam passes through the photomask along a first direction, hits the optical window, and is reflected toward a second direction by the optical window. The method for manufacturing the electronic sight includes: providing a base; providing an optical window disposed on a first end of the base; providing a point light source disposed on a second end of the base; providing a photomask; forming a low-reflective layer on the photomask; and positioning the photomask between the point light source and the optical window.