Electrophoresis Array Substrate Repair via Passivation Holes
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The electrophoresis type display device faces challenges in repairing open-circuited gate lines and data lines due to the thickness and material properties of the second passivation layer, which leads to incomplete contact and increased parasitic capacitance, affecting signal delay and repair reliability.
Innovation Solution
The array substrate design includes a second passivation layer with strategically formed holes over the data and gate lines, made of organic insulating material, and a third passivation layer of inorganic material, allowing for improved repair processes through laser beam irradiation and CVD repair, ensuring smooth contact and reduced parasitic capacitance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of time
If the second passivation layer is made thicker to reduce parasitic capacitance, then signal delay is reduced, but repair reliability deteriorates due to incomplete contact during laser welding
Solution Approach 1:
The second passivation layer is segmented by forming holes at specific positions where laser welding will be performed. This segmentation allows the pixel electrode to directly contact the gate line or data line through the holes during repair, bypassing the thick passivation layer and ensuring reliable electrical connection while maintaining the thick passivation layer for parasitic capacitance reduction.
Solution Approach 2:
The holes in the second passivation layer act as intermediaries during the repair process. They provide a pathway for the pixel electrode to reach the conductive lines (gate line or data line) underneath, enabling effective laser welding and electrical connection without removing the entire thick passivation layer.
2Ease of manufacture
If the second passivation layer is made of organic insulating material for flexibility, then ease of manufacture is improved, but repair effectiveness deteriorates due to rough inner wall surfaces preventing smooth electrode contact
Solution Approach 1:
Holes are pre-formed in the organic insulating material passivation layer at strategic locations before the repair process. This preliminary action creates smooth-walled openings that guide the pixel electrode during laser welding, ensuring effective contact with the underlying conductive lines despite the organic material's inherent roughness.
Solution Approach 2:
The passivation layer exhibits different properties in different regions: the bulk organic insulating material provides flexibility and ease of manufacture, while the hole regions provide smooth walls for effective electrode contact during repair. This local differentiation resolves the contradiction between ease of manufacture and repair effectiveness.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design enhances the reliability of repairing open-circuited lines by allowing the pixel electrode to smoothly stream down and connect effectively, reducing parasitic capacitance and increasing the reflective region, thus improving the display's performance and efficiency.
Implementation Method 1
irradiating a laser beam on the first holes located at both sides, respectively, of an open-circuited portion of the open-circuited gate line, to melt the portions of the pixel electrodes of the first and second pixel regions and remove at least the gate insulating layer
Implementation Method 2
melt the portions of the pixel electrodes
Implementation Method 3
forming a connection pattern using a laser CVD repair apparatus to connect the pixel electrode of the first pixel region and the pixel electrode of the second pixel region
Data Source
AI summary
An array substrate for an electrophoresis type display device includes a plurality of gate lines on a substrate; a gate insulating layer on the plurality of gate lines; a plurality of data lines on the gate insulating layer and crossing the plurality of gate lines to define a plurality of pixel regions; a thin film transistor corresponding to each pixel region, the thin film transistor including a gate electrode, a semiconductor layer, and source and drain electrodes; a first passivation layer on the plurality of data lines; a second passivation layer on the first passivation layer, wherein the second passivation layer includes a first hole over the data line, and/or a second hole over the gate line with at least the gate insulating layer therebetween; and a pixel electrode on the second passivation layer and connected to the drain electrode, wherein a portion of the pixel electrode covers the first hole, and another portion of the pixel electrode covers the second hole. A method of manufacturing the same, and a method of repairing a line of the same is also disclosed.