Electroplating Indium Tin Oxide Coatings
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Solution Overview
Problem
Chemical vapor deposition (CVD) methods for manufacturing indium tin oxide (ITO) coatings are costly and inefficient, particularly for large-scale production due to equipment expenses and low deposition rates, and are not suitable for workpieces with complex shapes.
Innovation Solution
A manufacturing method involving electroplating indium and tin using specific electrolytes composed of choline chloride, urea, indium chloride, boric acid, and ascorbic acid, followed by annealing in an oxygen environment to form indium tin oxide, which is simpler and applicable to large-area production, using safe and reusable electrolytes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If chemical vapor deposition (CVD) is used to manufacture indium tin oxide coatings, then the coating can be formed on workpieces, but the equipment cost is expensive and the deposition rate is low
Solution Approach 1:
The patent replaces the chemical vapor deposition process with an electroplating process. Instead of using complex CVD equipment to deposit ITO coatings through chemical reactions, the invention uses simple electroplating tanks with electrolyte solutions to deposit indium and tin metals onto the workpiece through electrochemical reactions, significantly reducing equipment cost and complexity while improving deposition rate
Solution Approach 2:
The patent changes the fundamental process parameters from chemical vapor deposition to electroplating. By controlling current density, electrolyte composition, and temperature in the electroplating process, the invention achieves high deposition rates and high-quality ITO coatings without requiring expensive CVD equipment
2Adaptability or versatility
If chemical vapor deposition (CVD) is used to manufacture indium tin oxide coatings, then the coating can be formed, but the process is difficult to correspond to workpieces with complicated shapes
Solution Approach 1:
The patent replaces CVD with electroplating, which naturally adapts to complex workpiece shapes. The electroplating process deposits metal uniformly on all surfaces including complex geometries, whereas CVD has difficulty covering complicated shapes. This substitution enables easy manufacturing of ITO coatings on workpieces with various complex shapes
Solution Approach 2:
The electroplating process provides universal applicability to different workpiece shapes and sizes. The same electroplating tank and electrolyte system can accommodate various complex geometries, making the process versatile and easy to manufacture for different applications without requiring shape-specific process adjustments
3Manufacturing precision
If chemical vapor deposition (CVD) is used to manufacture indium tin oxide coatings, then the coating can be formed, but the cost remains high due to equipment expenses and low deposition rates
Solution Approach 1:
The patent replaces expensive CVD equipment with simple electroplating tanks, significantly reducing equipment investment and operational costs. The electroplating process achieves high-quality ITO coatings with controlled composition and structure while maintaining high deposition rates, thereby reducing production cost and improving productivity simultaneously
Solution Approach 2:
By changing from CVD to electroplating, the patent optimizes process parameters such as current density, electrolyte composition, and temperature to achieve high-quality coatings at lower cost. The electroplating process allows for precise control of metal deposition rates and coating composition, maintaining manufacturing precision while reducing production costs through simpler equipment and faster deposition
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method reduces production costs and enables efficient large-scale production of high-quality ITO coatings suitable for complex shapes, with improved deposition rates and reduced waste, while maintaining the electrical conductivity and transparency of ITO.
Implementation Method 1
applying a first operating current to electroplate indium onto the workpiece
Implementation Method 2
applying a second operating current to electroplate tin onto the workpiece
Implementation Method 3
annealing the indium and tin on the workpiece to form indium tin oxide in an oxygen environment
Data Source
AI summary
The present disclosure provides a manufacturing method of indium tin oxide, including: providing a first electrolyte including choline chloride, urea, indium chloride, boric acid, and ascorbic acid; disposing a workpiece, wherein at least a part of the workpiece is in contact with the first electrolyte; heating the first electrolyte to 60° C.-95° C.; applying a first operating current to electroplate indium onto the workpiece; providing an second electrolyte including choline chloride, urea, tin chloride, boric acid, and ascorbic acid; disposing the indium-coated workpiece, wherein at least a part of the workpiece is in contact with the second electroplate; heating the second electroplate to 60° C.-95° C.; applying a second operating current to electroplate tin onto the workpiece; and annealing the indium and tin on the workpiece to form indium tin oxide in an oxygen environment.