Electroplating Tank Segmentation for Balanced Polishing and Layer Growth

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Existing electroplating and polishing processes often struggle to balance the simultaneous performance of electroplating and polishing, leading to potential hindrance in plated layer growth due to excessive polishing.

Innovation Solution

An electroplating apparatus with a magnetic rotator that generates an alternating magnetic field, sectioning the tank into two spaces, allowing objects to shift between electroplating and polishing conditions by moving laterally, thereby balancing the processes.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Strength

If electroplating and polishing are performed simultaneously in the same bath, then plated layer adhesion is improved, but plated layer growth is hindered due to excessive polishing

Engineering Contradiction:
Improveplated layer adhesionVSAvoidplated layer growth
Core Design Contradiction:
StrengthVSManufacturing precision

Solution Approach 1:

The tank is divided into a first space for electroplating and a second space for polishing by the magnetic rotator. The magnetic rotator sections the internal space of the electroplating tank into a first space occupying a space above the magnetic rotator and a second space occupying a remaining space other than the first space. This spatial segmentation allows independent optimization of electroplating and polishing processes without mutual interference.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The magnetic rotator is movable in a lateral direction intersecting a rotational axis, allowing dynamic adjustment of the space division between electroplating and polishing zones. This enables shifting objects between electroplating condition (in the first space) and polishing condition (in the second space) according to process requirements, providing dynamic control over the balance between plated layer growth and surface finishing.

Inventive Principle:
Principle #15Dynamics

2Device complexity

If magnetic rotator is stationary, then device structure is simplified, but uniform polishing and electroplating cannot be achieved

Engineering Contradiction:
Improvemagnetic rotator structureVSAvoiduniformity of plated layer
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The magnetic rotator is configured to be movable in a lateral direction intersecting its rotational axis. This dynamic capability allows the magnetic rotator to move to different positions to provide uniform polishing action across the entire surface of objects, while maintaining the relatively simple structure of a single rotating component rather than multiple complex mechanisms.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The magnetic rotator rotates about its axis while also being movable in a lateral direction, creating a periodic motion pattern. This periodic action ensures that all surfaces of objects receive uniform polishing and electroplating treatment over time, as objects are repeatedly exposed to different zones of the magnetic field and mechanical action.

Inventive Principle:
Principle #19Periodic action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Facilitates a well-balanced electroplating and polishing process, ensuring uniform plated layer growth and adhesion without excessive polishing, allowing for efficient production of plated objects.

Implementation Method 1

at least one magnetic rotator rotatably arranged under the electroplating tank so as to generate an alternating magnetic field

Methodology Applied
Scientific EffectAlternating magnetic field: Alternating Magnetic Field

Implementation Method 2

rotating a magnetic rotator under the electroplating tank so as to move the magnetic media in the electrolyte solution in accordance with magnetic attraction and magnetic repulsion

Methodology Applied
Scientific EffectMagnetic attraction: Magnetism

Implementation Method 3

rotating a magnetic rotator under the electroplating tank so as to move the magnetic media in the electrolyte solution in accordance with magnetic attraction and magnetic repulsion

Methodology Applied
Scientific EffectMagnetic repulsion: Magnetism

Implementation Method 4

electroplating to-be-electroplated objects in an electroplating tank that stores an electrolyte solution

Methodology Applied
Scientific EffectElectroplating: Electroplating

Implementation Method 5

electroplating and agitating are simultaneously performed so that plated layers are more firmly adhered to base members

Methodology Applied
Scientific EffectElectrochemical deposition: Electrodeposition

Implementation Method 6

electroplating and agitating are simultaneously performed so that plated layers are more firmly adhered to base members

Methodology Applied
Scientific EffectMechanical agitation: Stirring

Data Source

PatentUS12351930B2Electroplating device and method for manufacturing plated product
Publication Date: 2025.07.08 YKK CORP
  • US12351930B2 patent drawing
  • US12351930B2 patent drawing
  • US12351930B2 patent drawing

AI summary

Electroplating apparatus includes an electroplating tank that stores an electrolyte solution in which at least objects to be electroplated and magnetic media sink, and at least one magnetic rotator rotatably arranged under the electroplating tank so as to generate an alternating magnetic field. The magnetic rotator is arranged to section an internal space of the electroplating tank into a first space occupying a space above the magnetic rotator and a second space occupying a remaining space other than the first space. The magnetic rotator is arranged to be movable in a lateral direction intersecting a rotational axis of the magnetic rotator, allowing the objects to be shifted between a condition of being present in the electrolyte solution and in the first space and a condition of being present in the electrolyte solution and in the second space.