Electrospray Stencil Mask Patterning for Clog-Free Organic Microstructures

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Solution Overview

Problem

Existing methods struggle to form micro- and nano-patterns with high precision using organic materials due to challenges such as material weakness to heat or vacuum, peeling of masking materials, and clogging of stencil masks, limiting the formation of complex nano-scale patterns.

Innovation Solution

A pattern forming apparatus utilizing a capillary, power source, stencil mask, and cross-direction actuator to precisely deposit organic materials on a substrate, employing electrostatic and magnetic fields to control particle trajectory and avoid clogging, enabling formation of micro- and nano-scale patterns with a stencil mask capable of active particle trajectory control.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a conventional stencil mask is used for nano-scale patterning, then particle deposition can be achieved, but particles are highly likely to block the hole, thus hindering nano-scale patterning

Engineering Contradiction:
Improvepatterning precisionVSAvoidparticle trajectory control
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The patent replaces the conventional mechanical stencil mask system with an electrospray deposition system that uses electric fields to control particle trajectories. Instead of relying on physical holes in a mask that clog with particles, the system uses a capillary to spray charged particles onto the substrate, with the electric field guiding the particle paths. This substitution of mechanical control with electromagnetic control resolves the clogging issue while maintaining nano-scale patterning precision.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the physical parameters of the deposition system by introducing electric fields and controlling voltage applied to the capillary. By adjusting the voltage parameter, the system can control the charge and trajectory of sprayed particles, enabling precise deposition without the physical constraints of conventional stencil masks. This parameter change from mechanical to electrical control allows continuous operation without clogging.

Inventive Principle:
Principle #35Parameter changes

2Ease of manufacture

If screen printing, spotting, or contact printing is used for patterning organic materials, then the material can be patterned, but it is difficult to form a micro-pattern or nano-pattern with high precision

Engineering Contradiction:
Improvematerial patterning capabilityVSAvoidmicro-pattern precision
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent replaces conventional mechanical patterning methods (screen printing, spotting, contact printing) with an electrospray deposition system. The electrospray method uses a capillary to spray charged particles under the influence of an electric field, enabling precise control of material deposition at micro and nano scales. This substitution maintains ease of manufacturing for organic materials while dramatically improving patterning precision.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Manufacturing precision

If vacuum deposition or etching is used for patterning, then inorganic materials can be patterned, but organic materials cannot be used as they are weak to heat or vacuum

Engineering Contradiction:
Improvepatterning precisionVSAvoidmaterial compatibility
Core Design Contradiction:
Manufacturing precisionVSAdaptability or versatility

Solution Approach 1:

The patent creates a benign processing environment by using electrospray deposition that operates at atmospheric pressure and ambient temperature, eliminating the need for vacuum conditions. This allows organic materials, which are sensitive to heat and vacuum, to be deposited without degradation. The method maintains high patterning precision while expanding material compatibility to include heat-sensitive organic materials.

Inventive Principle:
Principle #39Inert atmosphere (Inert environment)

Solution Approach 2:

The patent changes the processing parameters from high-temperature vacuum conditions to ambient temperature and atmospheric pressure conditions. By controlling the voltage and spray parameters of the electrospray system, precise patterning is achieved without subjecting organic materials to harsh environmental conditions, thus expanding material versatility.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables high-precision patterning of organic materials on substrates, allowing for both two-dimensional and three-dimensional patterns without clogging, and supports the formation of multi-array patterns with complex shapes.

Implementation Method 1

a method combining a stencil mask with an electrospray deposition method. A material solution electrically sprayed by the electrospray deposition method may be instantly dried in air

Methodology Applied
Scientific EffectElectrospray deposition: Electrostatic Deposition

Implementation Method 2

a novel stencil mask capable of actively controlling a particle trajectory by changing an electric field between a capillary into which the material solution is put and the substrate

Methodology Applied
Scientific EffectElectrostatic lens effect: Electrostatic Lens

Implementation Method 3

a cross-direction actuator moving the stencil mask in a cross direction crossing a direction in which the sample passes

Methodology Applied
Scientific EffectPiezoelectric actuation: Piezoelectric Effect

Data Source

PatentUS12589402B2Pattern forming apparatus
Publication Date: 2026.03.31 HANBAT NAT UNIV IND ACADEMIC COOPERATION FOUND
  • US12589402B2 patent drawing
  • US12589402B2 patent drawing
  • US12589402B2 patent drawing

AI summary

Provided is a pattern forming apparatus which may form a pattern on a substrate with high precision by using a material including an organic material, the pattern forming apparatus including: a capillary facing a grounded substrate and capable of storing a solution including a sample; a power source applying a voltage to the capillary; a stencil mask disposed between the capillary and the substrate, and including an opening through which the sample passes; and a cross-direction actuator moving the stencil mask in a cross direction crossing a direction in which the sample passes.