Electrostatic Chuck Annular Grooves for Substrate Temperature Uniformity
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Solution Overview
Problem
Conventional plasma processing techniques face challenges in achieving uniform temperature control of substrates due to local temperature singularities caused by direct contact between seal bands and the substrate, leading to non-uniform plasma processing.
Innovation Solution
The substrate processing apparatus incorporates an electrostatic chuck with a substrate support surface featuring a plurality of protrusions and a first annular groove group, which includes inner, intermediate, and outer annular grooves that communicate with gas supply paths, allowing for controlled gas flow and pressure management to regulate substrate temperature.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If seal bands are provided to divide the heat transfer space into multiple regions, then temperature control capability is improved, but local temperature singularities occur due to direct contact between seal bands and substrate
Solution Approach 1:
The patent introduces an intermediary structure (protrusions and grooves) between the seal bands and the substrate. The grooves are positioned between adjacent seal bands and extend from the substrate contact surface toward the heat transfer space, creating a mediating structure that prevents direct contact while allowing controlled heat transfer. This intermediary approach resolves the contradiction by eliminating local temperature singularities while preserving temperature control capability.
Solution Approach 2:
The patent segments the heat transfer space into multiple regions using seal bands with integrated grooves. Each groove creates a distinct heat transfer path, allowing independent temperature control in different regions of the substrate. This segmentation enables precise temperature management while the groove structure prevents direct seal band-substrate contact that causes temperature singularities.
2Temperature
If multiple seal bands are used to control temperature distribution, then temperature uniformity is improved, but device complexity increases
Solution Approach 1:
The patent merges the sealing function and the temperature control function into a single integrated structure. The grooves are formed as integral parts of the seal bands, combining the sealing function with the heat transfer channel function. This merging reduces device complexity by eliminating the need for separate sealing components and heat transfer channels, while still achieving temperature uniformity across the substrate.
Solution Approach 2:
The seal bands are designed with multi-functionality, serving both as sealing elements and as heat transfer channel structures. The grooves in the seal bands simultaneously provide sealing action and control heat distribution, allowing a single component to perform multiple functions. This universality reduces the overall number of components needed while maintaining temperature uniformity.
3Object-affected harmful factors
If grooves are provided between seal bands, then direct contact is prevented and temperature control is improved, but manufacturing complexity increases
Solution Approach 1:
The grooves are pre-formed as integral structures during the manufacturing of the seal bands, rather than being created as separate components or through complex assembly processes. This preliminary action of forming grooves during the base manufacturing process simplifies production by combining multiple functions into a single manufacturing step, reducing overall manufacturing complexity while achieving the desired contact prevention and temperature control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively controls the substrate temperature, improving the uniformity of plasma processing across the substrate plane by eliminating local temperature singularities and allowing for precise temperature control in different regions.
Implementation Method 1
an electrostatic chuck which is arranged on the base and has an upper surface
Implementation Method 2
at least one control valve configured to control a flow rate or pressure of gas supplied through the at least one first gas supply path
Data Source
AI summary
A substrate processing apparatus is provided. The apparatus comprises a chamber; a substrate support which is arranged in the chamber and has at least one first gas supply path; and at least one control valve configured to control a flow rate or pressure of gas supplied through the at least one first gas supply path. The substrate support includes a base, and an electrostatic chuck which is arranged on the base and has an upper surface. The upper surface has a plurality of protrusions and a first annular groove group. The first annular groove group comprises a first inner annular groove, a first intermediate annular groove, and a first outer annular groove. Any one of the first inner annular groove, the first intermediate annular groove, and the first outer annular groove communicates with the at least one first gas supply path.


