Electrostatic Chuck Edge Ring Sealing Against Plasma Byproducts
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In plasma processing, byproducts generated during the process tend to adhere to the electrostatic chuck, leading to particle generation and potential corrosion, which existing technologies fail to effectively prevent.
Innovation Solution
An electrostatic chuck design featuring a first region for substrate support and a second region for an edge ring, with an elastic member between the edge ring and the chuck, ensuring that the edge ring is accommodated in a space between the regions, and a sheet member made of elastic material is used to eliminate gaps and prevent byproducts from entering this space.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a focus ring is disposed on the electrostatic chuck to enhance plasma process uniformity, then plasma processing uniformity is improved, but gaps between the focus ring and substrate edge expose the electrostatic chuck to byproducts, causing particle generation and corrosion
Solution Approach 1:
An elastic member is introduced as an intermediary component between the focus ring and the electrostatic chuck. This elastic member fills the gap that would otherwise expose the electrostatic chuck to byproducts, while not interfering with the focus ring's plasma uniformity enhancement function. The elastic member acts as a protective mediator that blocks harmful byproduct deposition.
Solution Approach 2:
The elastic member is implemented as a flexible component that can deform to accommodate the focus ring while maintaining continuous coverage over the electrostatic chuck surface. This flexible structure effectively seals the gap between the focus ring and substrate edge, preventing byproduct exposure without compromising the focus ring's functional performance.
2Stability of the object's composition
If the electrostatic chuck surface is kept flat for substrate support, then substrate holding stability is improved, but gaps remain at the edge where byproducts can adhere, leading to particle generation
Solution Approach 1:
The elastic member serves as a protective intermediary that covers the electrostatic chuck's edge region without disrupting the flat substrate support surface. It blocks the exposure of the electrostatic chuck to plasma byproducts at the edge, preventing particle generation while maintaining substrate holding stability.
Solution Approach 2:
The harmful function of the electrostatic chuck's edge region (which exposes byproducts to particle generation) is extracted and isolated by the elastic member. The elastic member separates the edge region from plasma exposure, allowing the main substrate support surface to remain flat and stable while the edge is protected independently.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design effectively prevents byproducts and radicals from entering the gap, reducing particle generation and corrosion of the electrostatic chuck, thereby enhancing the plasma processing apparatus's performance and longevity.
Implementation Method 1
an elastic member is disposed between the part of the edge ring and the electrostatic chuck
Implementation Method 2
an electrostatic chuck for supporting a substrate and an edge ring... configured to hold the substrate that is placed on the first top surface
Data Source
AI summary
There is provision of an electrostatic chuck for supporting a substrate and an edge ring including a first region, a second region, an electrode provided in the second region, and an elastic member. The first region includes a first top surface and is configured to hold the substrate that is placed on the first top surface. The second region extends in a circumferential direction of the first region so as to surround the first region. The second region includes a second top surface, and is configured to support the edge ring placed on the second top surface. The first top surface and the second top surface extend along a single flat plane. A part of the edge ring is accommodated in a space provided between the first region and the second region, and the elastic member is disposed between the part of the edge ring and the electrostatic chuck.