Electrostatic Chuck Groove Structure for Laser Etching Damage Reduction
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Laser beams used in etching processes during the manufacture of display devices can cause damage to substrates, leading to peeling of particles and reduced processing quality.
Innovation Solution
The use of an electrostatic chuck with a recessed groove structure on its lower surface, which reduces the energy of the laser beam before it reaches the chuck, thereby minimizing damage and allowing for multiple substrates to be processed without replacing the chuck, improving etching efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a conventional electrostatic chuck without recesses is used, then the chuck can support the substrate for etching processing, but the laser beam damages the lower surface of the chuck causing particle peeling and requiring frequent replacement
Solution Approach 1:
The patent extracts the harmful interaction between the laser beam and the chuck by creating recesses that remove the chuck material from the laser path. The recesses are formed in the lower surface of the chuck at positions corresponding to the substrate processing area, effectively taking out the portion that would be damaged by the laser beam, preventing particle generation and chuck replacement
Solution Approach 2:
The recesses act as an intermediary structure between the laser beam and the chuck body. By introducing this intermediate feature, the laser beam passes through the recessed areas without directly impacting the solid chuck material, thereby mediating the harmful interaction and preventing damage while maintaining the chuck's substrate support function
2Manufacturing precision
If the chuck is replaced frequently due to laser damage, then the chuck surface can be maintained, but the etching process efficiency is reduced due to replacement time
Solution Approach 1:
The recesses are pre-formed in the chuck before the etching process begins. This preliminary action of creating the protective recess structure eliminates the need for subsequent chuck replacements, allowing continuous high-efficiency processing while maintaining surface quality. The chuck is prepared in advance with the damage-preventing feature integrated into its design
3Productivity
If the lower surface of the chuck is exposed to the laser beam, then the etching process can be performed, but the laser energy damages the chuck and causes particle peeling onto the substrate
Solution Approach 1:
The patent converts the harmful laser beam into a beneficial tool by using it to pre-form the recesses in the chuck. The laser beam that would otherwise cause damage is first used to create the protective recess structure, then the same or subsequent laser beams can perform the substrate etching without generating particles, thus converting the harmful factor into a beneficial preparatory step
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively reduces damage to the electrostatic chuck and enhances the reliability and efficiency of the etching process by preventing particle peeling and allowing for continuous processing without chuck replacement.
Implementation Method 1
electrostatic chuck
Implementation Method 2
the laser beam passing through the target substrate may be reduced in energy while travelling through the space, e.g., the groove, before reaching the lower surface of the chuck
Data Source
AI summary
The chuck for supporting a target substrate for a display device, the chuck includes: a base having a first surface to support an object and a second surface opposite the first surface, the first surface including a first area and a second area; and indentations formed in the second area and recessed from the first area in a thickness direction of the base. The indentations include a first indentation extending in a first direction and a second indentation extending in a second direction intersecting the first direction.