Electrostatic Chuck Layout for Precise Display Mask Alignment

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Solution Overview

Problem

Existing manufacturing processes for display apparatuses, such as organic light-emitting displays, suffer from high process loss and yield issues due to inadequate substrate attachment and alignment during deposition processes.

Innovation Solution

An apparatus is designed with an electrostatic chuck and a mask frame configuration that allows for independent driving of the electrostatic chuck and a first plate, ensuring precise substrate attachment and alignment, reducing overlap and increasing adhesive force, thereby minimizing process loss and enhancing yield.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If the mask frame and electrostatic chuck are positioned closely to improve alignment precision, then manufacturing precision improves, but the risk of substrate damage and process loss increases

Engineering Contradiction:
Improvealignment precisionVSAvoidprocess yield
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The electrostatic chuck is divided into two functional regions: a first region that overlaps with the mask frame for precise alignment, and a second region that does not overlap with the mask frame to prevent substrate damage. This segmentation allows each region to fulfill its specific function without compromising the other.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different regions of the electrostatic chuck are assigned different functional properties: the first region provides alignment precision through overlap with the mask frame, while the second region provides substrate protection through non-overlap. This local differentiation of functional quality resolves the contradiction between precision and safety.

Inventive Principle:
Principle #3Local quality

2Force

If the electrostatic chuck overlaps the mask frame to enhance attachment force, then adhesive force improves, but substrate defects like shadow and icicle formation increase

Engineering Contradiction:
Improveadhesive forceVSAvoidsubstrate defects
Core Design Contradiction:
ForceVSObject-generated harmful factors

Solution Approach 1:

The electrostatic chuck is segmented into a first region overlapping the mask frame for attachment force and a second region not overlapping for defect prevention. This spatial segmentation allows the system to achieve both strong attachment and defect-free substrate surfaces.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The electrostatic chuck exhibits local quality differentiation where the first region provides high adhesive force through overlap, while the second region maintains low defect generation through non-overlap. This local functional differentiation simultaneously achieves strong attachment and prevents substrate defects.

Inventive Principle:
Principle #3Local quality

3Strength

If the mask frame thickness is increased to improve structural strength, then strength improves, but the overlap area with the electrostatic chuck increases causing more substrate defects

Engineering Contradiction:
Improvemask frame strengthVSAvoidshadow and icicle defects
Core Design Contradiction:
StrengthVSObject-generated harmful factors

Solution Approach 1:

The mask frame is segmented into a first portion that overlaps the electrostatic chuck and a second portion that does not overlap. This segmentation allows the overlapping portion to provide structural strength while the non-overlapping portion prevents substrate defects.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The mask frame exhibits local quality differentiation where the first portion provides structural strength through overlap with the electrostatic chuck, while the second portion prevents substrate defects by maintaining non-overlap. This local functional differentiation simultaneously achieves structural integrity and defect prevention.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The apparatus improves process yield by maintaining precise alignment and adhesive force, reducing defects like shadow and icicle formation, and increasing the flatness of the substrate, leading to higher production efficiency.

Implementation Method 1

An electrostatic chuck is configured to attach the substrate to the at least one mask

Methodology Applied
Scientific EffectElectrostatic force: Electrostatics

Data Source

PatentUS12494394B2Apparatus and method of manufacturing display apparatus
Publication Date: 2025.12.09 SAMSUNG DISPLAY CO LTD
  • US12494394B2 patent drawing
  • US12494394B2 patent drawing
  • US12494394B2 patent drawing

AI summary

An apparatus for manufacturing a display apparatus includes a substrate. A mask assembly includes an opening, a mask frame surrounding the opening, and at least one mask coupled to the mask frame. An electrostatic chuck is configured to attach the substrate to the at least one mask. A first driver is configured to drive the electrostatic chuck. At least a partial portion of the mask frame does not overlap the electrostatic chuck in a thickness direction of the substrate.