Electrostatic Chuck Magnetic Layout for Mask Warpage Control

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Solution Overview

Problem

Existing deposition processes face issues with process variation and yield due to warpage phenomena in large-sized base substrates and masks, which are exacerbated by uneven support and gravitational forces, leading to inconsistent deposition on display devices.

Innovation Solution

The deposition apparatus incorporates an electrostatic chuck with strategically positioned magnetic bodies of varying magnetic properties and sizes within internal grooves, complemented by a plate with a permanent magnet, to counteract gravitational forces and maintain alignment, thereby reducing warpage and enhancing deposition precision.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of stationary object

If large-sized base substrates and masks are used for deposition, then the deposition area is increased, but warpage phenomena occur due to uneven support and gravitational forces

Engineering Contradiction:
Improvedeposition areaVSAvoidflatness
Core Design Contradiction:
Area of stationary objectVSStability of the object's composition

Solution Approach 1:

The patent introduces a magnetic counterbalancing mechanism where magnetic bodies are positioned on the electrostatic chuck and a permanent magnet is placed on the plate. This creates a magnetic force that counteracts the gravitational force acting on the mask and base substrate, preventing warpage and maintaining flatness during the deposition process.

Inventive Principle:
Principle #8Anti-weight (Counterweight)

2Manufacturing precision

If gravitational forces act on large-sized components, then alignment between mask and substrate deteriorates, but increasing support structures increases device complexity

Engineering Contradiction:
Improvealignment precisionVSAvoidsupport structure complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent replaces complex mechanical support structures with a magnetic field-based system. Instead of using additional mechanical supports to counteract gravity and maintain alignment, the invention uses magnetic bodies and a permanent magnet to create a magnetic force field that maintains the positional relationship between the mask and base substrate without mechanical intervention.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Ease of manufacture

If uniform magnetic properties are used in the electrostatic chuck, then manufacturing is simplified, but warpage cannot be effectively counteracted in specific areas

Engineering Contradiction:
Improveelectrostatic chuck manufacturingVSAvoidflatness control
Core Design Contradiction:
Ease of manufactureVSStability of the object's composition

Solution Approach 1:

The patent implements non-uniform magnetic properties in the electrostatic chuck by positioning multiple magnetic bodies with different magnetic permeabilities and/or susceptibilities at different locations. This local variation in magnetic properties allows the magnetic force to be optimized for counteracting warpage in specific areas where it is most needed, while maintaining overall manufacturing feasibility.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively stabilizes the mask and substrate alignment, reducing warpage and improving process consistency and yield by ensuring uniform deposition across large areas.

Implementation Method 1

the plate includes a permanent magnet... a magnetic force generated by the permanent magnet may serve to counterbalance a gravitational force

Methodology Applied
Scientific EffectMagnetic force: Magnetism

Implementation Method 2

a magnetic force generated by the permanent magnet may serve to counterbalance a gravitational force

Methodology Applied
Scientific EffectGravitational force: Gravitation

Implementation Method 3

an electrostatic chuck disposed on the base substrate... may allow a close adhesion between the mask and the base substrate

Methodology Applied
Scientific EffectElectrostatic force: Electrostatics

Data Source

PatentUS12584210B2Deposition apparatus
Publication Date: 2026.03.24 SAMSUNG DISPLAY CO LTD
  • US12584210B2 patent drawing
  • US12584210B2 patent drawing
  • US12584210B2 patent drawing

AI summary

A deposition apparatus for depositing a deposition material on a base substrate disposed on a mask, includes: a mask assembly including a mask frame which defines an opening therein and surrounds the opening, and the mask disposed on the mask frame; an electrostatic chuck disposed on the base substrate; and a plate disposed on the electrostatic chuck. The electrostatic chuck includes a plurality of magnetic bodies, and a magnetic property of at least one magnetic body among the plurality of magnetic bodies is different from a magnetic property of remaining magnetic bodies except for the at least one magnetic body among the plurality of magnetic bodies.