Electrostatic Chuck Plasma Discharge Without Opening the Vacuum Chamber
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Solution Overview
Problem
Existing electrostatic chucks in electron beam evaluation systems face issues with charge accumulation that attract samples, necessitating time-consuming and contaminating vacuum chamber openings for discharge.
Innovation Solution
A plasma distribution unit within the vacuum chamber receives plasma from an external source to discharge the electrostatic chuck, controlled by a controller, allowing for a brief plasma distribution period to neutralize charges without scanning the entire chuck.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the vacuum chamber is opened to discharge the electrostatic chuck, then the charge is discharged, but the process is time-consuming and introduces contamination
Solution Approach 1:
A plasma distribution unit is introduced as an intermediary mechanism to discharge the electrostatic chuck without opening the vacuum chamber. The plasma, generated by an electron beam, serves as a mediator that neutralizes the accumulated charge on the chuck surface while maintaining vacuum integrity, thus resolving the contradiction between effective discharge and time loss
Solution Approach 2:
The mechanical process of opening the vacuum chamber is replaced by a plasma-based discharge mechanism. Instead of physically accessing the chuck to discharge it, the system uses plasma generated within the vacuum environment to neutralize charges, eliminating the time-consuming mechanical operation while maintaining vacuum conditions
2Reliability
If the vacuum chamber is opened to discharge the electrostatic chuck, then the charge is discharged, but contamination is introduced
Solution Approach 1:
The plasma distribution unit acts as an intermediary that enables charge discharge without breaking vacuum seal. The plasma, generated internally, provides a contamination-free pathway for neutralizing charges on the electrostatic chuck, eliminating the harmful contamination effect while maintaining discharge effectiveness
Solution Approach 2:
The vacuum chamber maintains its inert vacuum environment throughout the discharge process. By generating and distributing plasma within this controlled environment, the system ensures that the discharge operation does not introduce external contaminants, preserving the purity of the vacuum space
3Reliability
If plasma distribution period is extended to discharge the electrostatic chuck, then discharge is achieved, but the process becomes longer than necessary
Solution Approach 1:
The plasma distribution is applied in a controlled manner that provides sufficient action for complete discharge without excessive duration. The electron beam parameters are adjusted to deliver just enough plasma to neutralize the accumulated charge efficiently, achieving both complete discharge and high productivity
Solution Approach 2:
The system monitors the discharge process and adjusts plasma distribution parameters accordingly. By detecting the charge status of the electrostatic chuck and modulating the electron beam plasma generation, the system achieves complete discharge in minimal time, balancing reliability and productivity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively and quickly discharges the electrostatic chuck, preventing sample attraction while maintaining vacuum integrity and avoiding contamination, with a process shorter than traditional cleaning processes.
Implementation Method 1
a plasma distribution unit that is configured to receive plasma from an external plasma source and perform a distribution of the plasma within the vacuum chamber that discharges the electrostatic chuck
Data Source
AI summary
A device for discharging an electrostatic chuck located within a vacuum chamber, the device includes a plasma distribution unit that is configured to receive plasma from an external plasma source that is located outside the vacuum chamber, and perform a distribution of the plasma within the vacuum chamber that discharges the electrostatic chuck. The device also includes a controller for controlling the distribution of the plasma; wherein the distribution of the plasma occurs during a plasma distribution period that is shorter than a duration of a plasma based cleaning process of the electrostatic chuck.


