Electrostatic Chuck Attraction Detection via Heater Power Fluctuation
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Solution Overview
Problem
In semiconductor manufacturing, insufficient suction force from the electrostatic chuck can lead to abnormal temperature control of substrates during processing, as the existing technologies fail to reliably detect and address weak attraction forces.
Innovation Solution
A substrate processing apparatus equipped with an electrostatic chuck, a heater, and a detector that monitors power fluctuations to the heater, allowing for the detection of abnormal substrate attraction based on heat transfer coefficients and power changes, ensuring sufficient suction force is maintained.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the electrostatic chuck is used to hold the substrate, then the substrate can be positioned for processing, but the attraction force may be insufficient leading to abnormal temperature control
Solution Approach 1:
The patent introduces heat transfer coefficient as an intermediary parameter to indirectly detect the attraction force of the electrostatic chuck. Instead of directly measuring the difficult-to-detect attraction force, the system uses the heat transfer coefficient (obtained from temperature distribution data) as a mediator that correlates with attraction force strength, enabling reliable detection without direct force measurement instruments
Solution Approach 2:
The patent replaces direct mechanical force measurement with a thermal field-based detection method. By using temperature distribution measurements and heat transfer analysis to infer attraction force, the system substitutes complex mechanical sensing with simpler thermal field measurements, achieving both improved reliability and easier implementation
2Device complexity
If the existing technology is used without attraction detection, then the device complexity is low, but the temperature control reliability deteriorates when attraction is insufficient
Solution Approach 1:
The patent makes the temperature measurement system multi-functional by using it for both its original purpose (monitoring substrate temperature for process control) and a new purpose (detecting electrostatic chuck attraction force through heat transfer coefficient analysis). This eliminates the need for separate detection instruments, maintaining low device complexity while improving temperature control reliability
Solution Approach 2:
The system performs self-diagnosis by using its own temperature measurement data to detect attraction abnormalities. The temperature distribution information, already collected for process control, is re-analyzed to calculate heat transfer coefficient and detect attraction issues, enabling the system to monitor its own health without external detection devices
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively detects and corrects for abnormal attraction forces, ensuring consistent temperature control and reliable substrate processing by monitoring power fluctuations and adjusting heating accordingly.
Implementation Method 1
a stage including an electrostatic chuck configured to attract a substrate
Implementation Method 2
a heater configured to heat the stage; a heating drive part configured to supply power to the heater
Implementation Method 3
the heater configured to heat the stage
Data Source
AI summary
A substrate processing apparatus includes: a stage including an electrostatic chuck configured to attract a substrate; a heater configured to heat the stage; a heating drive part configured to supply power to the heater so that a temperature of the stage becomes a target value; and a detector configured to detect an abnormality in attraction of the substrate by the electrostatic chuck, wherein the detector is further configured to detect the abnormality based on fluctuation of the power supplied to the heater, the fluctuation being generated by the attraction of the substrate by the electrostatic chuck.