Electrostatic Chuck Wear Detection Using an Embedded Label Layer

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Solution Overview

Problem

Existing substrate processing apparatuses face high maintenance costs due to the inability to accurately determine when supporting units, such as electrostatic chucks, need replacement during plasma etching processes.

Innovation Solution

Incorporation of a label material layer within the supporting unit, detectable by a measurement apparatus, to indicate when the supporting unit has been etched beyond a usable depth, allowing for timely replacement and reducing unnecessary maintenance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the supporting unit is used for extended periods to reduce replacement frequency, then productivity is improved, but measurement precision deteriorates because it becomes impossible to accurately determine when the supporting unit needs replacement

Engineering Contradiction:

Improveoperational efficiencyVSAvoiddetermination accuracy of replacement timing

Core Design Contradiction:

ProductivityVSMeasurement precision

Solution Approach 1:

A label material layer is embedded within the supporting unit at a predetermined depth before use. This label layer serves as a pre-prepared indicator that will be exposed at a specific etching depth, allowing the system to automatically signal when replacement is needed without requiring continuous monitoring or complex measurements during operation.

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The label material layer acts as an intermediary between the supporting unit and the measurement apparatus. Instead of directly measuring the supporting unit's condition or depth, the system detects the presence or absence of the label material (which has distinct optical properties), providing an indirect but reliable indicator of the supporting unit's etching state and replacement timing.

Inventive Principle:

Principle #24Intermediary (Mediator)

2Reliability

If the supporting unit is replaced frequently to ensure process quality, then reliability is improved, but loss of substance increases due to unnecessary replacements

Engineering Contradiction:

Improveprocess qualityVSAvoidmaintenance costs

Core Design Contradiction:

ReliabilityVSLoss of substance

Solution Approach 1:

The measurement apparatus continuously or periodically detects the label material layer's status, providing real-time feedback on the supporting unit's etching depth. This feedback mechanism allows the system to determine the precise moment when the supporting unit reaches its replacement threshold, enabling replacement only when necessary and avoiding both premature and delayed replacements.

Inventive Principle:

Principle #23Feedback

Solution Approach 2:

The label material layer is pre-positioned at a critical depth within the supporting unit, serving as a predetermined trigger point. This preliminary placement allows the system to know in advance exactly when the supporting unit will reach its functional limit, enabling planned replacement timing that avoids unnecessary early replacements while ensuring quality before the limit is reached.

Inventive Principle:

Principle #10Preliminary action

3Duration of action of moving object

If the label material layer is placed deeper in the supporting unit to extend usage, then duration of action is improved, but measurement precision deteriorates because the label material is exposed later

Engineering Contradiction:

Improveusage duration of supporting unitVSAvoiddetection timing accuracy

Core Design Contradiction:

Duration of action of moving objectVSMeasurement precision

Solution Approach 1:

The depth position of the label material layer is adjusted as a controllable parameter to optimize the balance between usage duration and detection accuracy. By changing this parameter, the system can configure the label layer to be exposed at the precise etching depth that corresponds to the optimal replacement point, ensuring both extended useful life and accurate timing detection.

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables precise determination of when to replace supporting units, thereby reducing maintenance costs and improving operational efficiency in substrate processing.

Implementation Method 1

an electromagnetic field is formed in an internal space of a chamber to form plasma, and the electromagnetic field excites a processing gas provided in the chamber into a plasma state

Methodology Applied

Scientific EffectPlasma: Plasma

Implementation Method 2

an electromagnetic field is formed in an internal space of a chamber to form plasma

Methodology Applied

Scientific EffectElectromagnetic field: Electromagnetic Induction

Implementation Method 3

The measurement apparatus may include an optical emission spectroscopy

Methodology Applied

Scientific EffectOptical emission spectroscopy: Absorption Spectroscopy

Data Source

PatentUS12592368B2Substrate processing apparatus and method

Publication Date: 2026.03.31 SYSTEM ENGINEERING MEGA SOLUTION CO LTD

AI summary

Provided is a substrate processing apparatus including a chamber having a processing space therein, a supporting unit arranged in the processing space, having a substrate located thereon, and including a label material layer including a label material therein, a plasma source configured to generate plasma from a processing gas in the processing space, and a measurement apparatus configured to detect the label material, wherein, when the supporting unit is etched to a depth that is greater than or equal to a first depth, the label material layer is exposed.