Electrostatic Mask Gap Control in Deposition Equipment

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Solution Overview

Problem

Existing deposition apparatuses face challenges in maintaining the gap between the mask and the deposition source or stage during the deposition process, leading to potential collisions and sagging of the mask, which can affect the precision and efficiency of the deposition process.

Innovation Solution

The deposition apparatus employs a configuration of electrode patterns with specific polarities and magnitudes of applied voltages to create repulsive or attractive forces between the mask and the stage or deposition source, adjusting the gap and preventing sagging, using conductive or magnetic materials for the electrode patterns.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the mask is disposed close to the deposition source to improve deposition efficiency, then productivity is improved, but the mask may collide with the deposition source or stage

Engineering Contradiction:

Improvedeposition efficiencyVSAvoidmask collision prevention

Core Design Contradiction:

ProductivityVSReliability

Solution Approach 1:

The patent replaces mechanical support structures with an electrostatic suspension system. Electrode patterns are formed on the mask, deposition source, and stage to generate electrostatic repulsive forces that suspend the mask in position without physical contact, eliminating mechanical collision risks while maintaining close proximity for efficient deposition

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the physical state of mask positioning from mechanical support to electrostatic field-based suspension. By applying voltages to electrode patterns, the system dynamically controls the electrostatic force parameters to maintain optimal gap distances, preventing collisions while maximizing deposition efficiency

Inventive Principle:

Principle #35Parameter changes

2Manufacturing precision

If the mask is suspended close to the deposition target to improve deposition precision, then manufacturing precision is improved, but the mask may sag due to gravity

Engineering Contradiction:

Improvedeposition precisionVSAvoidmask sagging

Core Design Contradiction:

Manufacturing precisionVSStability of the object's composition

Solution Approach 1:

The patent uses electrostatic repulsive forces generated by electrode patterns to counteract the gravitational force acting on the mask. The electrostatic force acts as an anti-weight mechanism that balances gravity, preventing mask sagging while maintaining close proximity to the deposition target for high precision deposition

Inventive Principle:

Principle #8Anti-weight (Counterweight)

Solution Approach 2:

The patent replaces mechanical support structures that would physically hold the mask with an electrostatic field-based suspension system. The electrostatic forces from the electrode patterns provide the necessary support to counteract gravity without mechanical contact, eliminating sagging while maintaining deposition precision

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

3Reliability

If electrode patterns are added to the mask and deposition source to create repulsive forces, then reliability is improved by preventing collisions, but device complexity increases

Engineering Contradiction:

Improvecollision preventionVSAvoidelectrode pattern configuration

Core Design Contradiction:

ReliabilityVSDevice complexity

Solution Approach 1:

The patent divides the electrode system into multiple segmented electrode patterns: first electrode patterns on the mask, second electrode patterns on the deposition source, and third electrode patterns on the stage. This segmentation allows independent control of different electrostatic fields to manage complexity while achieving reliable collision prevention through coordinated operation

Inventive Principle:

Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration maintains the gap between the mask and the deposition target, preventing collisions and ensuring precise and efficient deposition of materials onto the substrate.

Implementation Method 1

a repulsive force may occur between the stage electrode pattern and the first upper electrode pattern

Methodology Applied

Scientific EffectElectrostatic repulsion: Electrostatics

Data Source

PatentUS20250273469A1Deposition apparatus and deposition method using the same

Publication Date: 2025.08.28 SAMSUNG DISPLAY CO LTD

AI summary

A deposition device includes a deposition source which accommodates a deposition material, a mask including an electrode pattern to which a first voltage is applied, a stage to which a deposition target substrate is fixed, and a stage electrode pattern to which a second voltage is applied. A polarity of the first voltage and a polarity of the second voltage are same.