Electrostatic Mask Stage Structure for Deposition Mask Sagging

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

The sagging of deposition masks during the manufacturing process for high-resolution display panels, such as those required for wearable devices like AR glasses, leads to misalignment between organic light-emitting layers and anode electrodes, compromising the display quality.

Innovation Solution

A mask stage with an electrostatic chuck and lattice support structure is employed to prevent sagging, ensuring close contact between the deposition mask and the substrate, using electrostatic forces to hold the mask edges and a lattice plate to support the remaining mask portions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a deposition mask is used for high-resolution display manufacturing, then manufacturing precision is improved, but the mask sags downward during deposition causing misalignment

Engineering Contradiction:
Improvealignment precisionVSAvoidmask flatness
Core Design Contradiction:
Manufacturing precisionVSStability of the object's composition

Solution Approach 1:

The support structure is divided into two functional segments: an electrostatic chuck that holds the edge portion of the mask, and a lattice support that supports the remaining portion. This segmentation allows each component to address specific aspects of mask stability, preventing sagging while maintaining the overall structural integrity needed for high-resolution deposition

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent replaces traditional mechanical support systems with an electrostatic chuck that uses electrostatic forces to hold the mask edge. This substitution provides more precise and stable positioning without the mechanical contact and deformation issues associated with conventional support mechanisms

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Manufacturing precision

If the mask membrane is made thin for high-resolution patterning, then manufacturing precision is improved, but the mask becomes prone to sagging

Engineering Contradiction:
Improvepattern resolutionVSAvoidmask rigidity
Core Design Contradiction:
Manufacturing precisionVSStrength

Solution Approach 1:

Different regions of the mask are provided with different support characteristics: the edge portion is held by the electrostatic chuck which provides strong localized holding force, while the remaining portion is supported by the lattice structure. This local differentiation allows the thin membrane to maintain its high-resolution patterning capability while preventing sagging through targeted support in critical regions

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively prevents sagging, maintaining alignment and ensuring high-resolution deposition processes, thereby enhancing the quality and reliability of the display panels.

Implementation Method 1

a chucking region having a ring shape in a plan view disposed around the through hole to hold the edge portion of the deposition mask using an electrostatic force

Methodology Applied
Scientific EffectElectrostatic force: Electrostatics

Data Source

PatentUS20250376759A1Mask stage and deposition apparatus including the same
Publication Date: 2025.12.11 SAMSUNG DISPLAY CO LTD
  • US20250376759A1 patent drawing
  • US20250376759A1 patent drawing
  • US20250376759A1 patent drawing

AI summary

A mask stage includes an electrostatic chuck having a plate shape in a plan view through which a through hole is formed and supporting an edge portion of a deposition mask, and a lattice support disposed in the through hole and supporting a remaining portion of the deposition mask other than the edge portion. The electrostatic chuck includes a chucking region having a ring shape in a plan view disposed around the through hole to hold the edge portion of the deposition mask using an electrostatic force.