Electrostatic Zone Plate for Aberration Correction
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Solution Overview
Problem
Particle-beam systems face challenges in compensating for higher-order aberrations and distortions, particularly in lithography and nano-scale patterning applications, where existing technologies struggle to correct imaging issues beyond third-order aberrations and misalignment.
Innovation Solution
A particle-beam system utilizing a composite plate electrode with multiple partial electrodes, forming an electrostatic zone plate (EZP), which applies different electrostatic potentials to create a diverging lens that can correct aberrations and distortions by integrating with existing tube electrodes, allowing for radial and circular image distortion correction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If electrostatic lenses formed by annular electrodes are used, then focusing capability is achieved, but third-order aberrations are significantly introduced
Solution Approach 1:
The patent divides the plate electrode into multiple independently controllable segments or zones. Each segment can be adjusted with different potentials, allowing the lens to correct aberrations by creating non-uniform field distributions that compensate for third-order effects while maintaining focusing capability.
Solution Approach 2:
The patent introduces dynamically adjustable plate electrodes that can change their potential distribution in real-time. This dynamic control allows the system to adapt the lens characteristics to compensate for aberrations under different operating conditions, transforming a static aberration problem into a controllable parameter.
2Manufacturing precision
If diverging lenses are introduced to compensate aberrations, then third-order aberrations are reduced, but device complexity increases due to additional plate or control grid electrodes
Solution Approach 1:
The patent combines the aberration compensation function with the existing lens structure by integrating plate electrodes into the conventional annular electrode configuration. This merging approach allows both focusing and aberration correction functions to be achieved within a unified electrode system, reducing overall device complexity.
Solution Approach 2:
The patent designs plate electrodes that serve multiple functions: they contribute to the overall focusing power of the lens system while simultaneously providing aberration compensation capabilities. This multi-functionality eliminates the need for separate dedicated aberration correction elements, simplifying the device architecture.
3Adaptability or versatility
If conventional lens systems are used, then basic focusing is achieved, but higher-order aberrations and distortions cannot be corrected
Solution Approach 1:
The patent applies different potentials to different regions or zones of the plate electrode, creating locally optimized field distributions. This allows specific higher-order aberrations to be corrected in different parts of the beam path, providing targeted correction capabilities that extend beyond conventional uniform lens designs.
Solution Approach 2:
The patent utilizes adjustable electrical parameters (potentials applied to plate and annular electrodes) to dynamically change the lens characteristics. By varying these parameters, the system can correct different types and orders of aberrations, providing adaptability without requiring physical reconfiguration of the lens structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively reduces aberration effects and improves image quality by forming an electrostatic lens with negative or positive refracting power, enabling correction of high-order aberrations and misalignment, enhancing the precision of particle-beam projection systems.
Implementation Method 1
A particle-beam system utilizing a composite plate electrode with multiple partial electrodes, forming an electrostatic zone plate (EZP), which applies different electrostatic potentials to create a diverging lens that can correct aberrations and distortions
Implementation Method 2
The composite electrode is composed of a number of partial electrodes which are arranged adjoining to each other and which can be applied with different electrostatic potentials
Data Source
AI summary
In a particle-beam projection processing apparatus for irradiating a target by a beam of energetic electrically charged particles, including an illumination system, a pattern definition system for positioning an aperture arrangement composed of apertures transparent to the energetic particles in the path of the illuminating beam, and a projection system to project the beam onto a target, there is provided at least one plate electrode device, which has openings corresponding to the apertures of the pattern definition system and including a composite electrode composed of a number of partial electrodes being arranged non-overlapping and adjoining to each other, the total lateral dimensions of the composite electrode covering the aperture arrangement of the pattern definition system. The partial electrodes can be applied different electrostatic potentials.