Elongate Deposition Source for Oblique Incidence Control
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Solution Overview
Problem
Oblique incidence deposition on large area substrates is challenging due to difficulties in achieving homogeneous layer thicknesses and precise control over the angle of incidence and azimuthal angle, especially at an industrial scale.
Innovation Solution
An apparatus with elongate rectangular material outlet openings and a shielding element with an elongate aperture, allowing for precise adjustment of the angle of incidence and distribution of material, combined with a drive arrangement for flexible movement and rotation, enabling homogeneous and gradient layer deposition.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If oblique incidence deposition is used to create magnetic anisotropy in ferromagnetic layers, then the magnetic properties and characteristics of the layers are improved, but the manufacturing complexity and time required for precise angle control increase significantly
Solution Approach 1:
The patent employs dynamic adjustment mechanisms that allow real-time modification of the angle of incidence during the deposition process. The deposition source or substrate holder can be rotated or tilted dynamically to achieve precise control over the angle at which material is deposited, enabling the creation of magnetic anisotropy without requiring a permanently complex fixed-angle system.
Solution Approach 2:
The invention utilizes parameter changes by varying the angle of incidence, deposition rate, and other process parameters during material deposition. By dynamically adjusting these parameters, the system can optimize magnetic anisotropy creation while avoiding the need for permanently complex mechanical structures.
2Manufacturing precision
If oblique incidence deposition is used to achieve controlled layer characteristics, then the quality of coating is improved, but the deposition time and production efficiency deteriorate
Solution Approach 1:
The patent implements periodic action through alternating deposition processes where the angle of incidence is varied periodically during deposition. This allows different regions of the substrate to receive material at optimized angles at different times, achieving uniform layer characteristics across the entire substrate while maintaining reasonable deposition speeds through continuous process cycling.
Solution Approach 2:
Dynamic adjustment of deposition parameters during the process allows the system to optimize both layer quality and deposition speed. By rapidly adjusting angles and rates in real-time, the system can maintain high productivity while achieving the precise layer characteristics required for magnetic anisotropy.
3Adaptability or versatility
If flexible adjustment of angle of incidence and azimuthal angle is implemented for multiple layers, then the adaptability for different layer configurations is improved, but the adjustment time and operational complexity increase
Solution Approach 1:
The patent applies preliminary action by pre-configuring the deposition system with programmable angle settings and automated control sequences. Before deposition begins, all required angle adjustments for multiple layers are pre-programmed, allowing the system to automatically transition between different deposition angles and azimuthal orientations without manual intervention, thus reducing adjustment time while maintaining high adaptability.
Solution Approach 2:
The invention replaces manual mechanical adjustment systems with automated control mechanisms, including computer-controlled motors and sensors that can rapidly and precisely adjust deposition angles. This substitution of automated systems for manual operations dramatically reduces adjustment time between layers while maintaining full flexibility for different layer configurations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise, cost-efficient, and flexible production of layers with controlled magnetic properties on large area substrates, suitable for industrial-scale manufacturing of magnetoelectronic devices and other applications.
Implementation Method 1
Each of the deposition sources (5) is a physical vapor deposition source
Data Source
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Figure 1b
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AI summary
The invention relates to an apparatus for depositing material on the surface of a substrate. The apparatus comprises at least one deposition source comprising a material outlet opening and being adapted to emit material from the material outlet opening, wherein the material outlet opening has an elongate central region comprising two opposite straight parallel spaced edges delimiting the material outlet opening on opposite sides, wherein an axis extending parallel to and in the middle between the two opposite edges is a longitudinal axis of the central region of the material outlet opening, a substrate holder adapted to support a substrate thereon, a support structure comprising a source mounting portion, which is selectively rotatable about a first axis and to which the at least one deposition source is mounted such that it rotates about the first axis together with the source mounting portion and such that the longitudinal axis of the central region of the material outlet opening of the at least one deposition source is parallel to the first axis, a shielding element disposed between the at least one deposition source and the substrate holder and having an aperture, which has two opposite sides on opposite sides of a straight line extending parallel to the first axis, and a drive arrangement adapted to selectively cause a rotation of the source mounting portion about the first axis, selective adjustment of a width of the aperture defined by the distance between the two opposite sides of the aperture, and a relative movement between the substrate holder on the one hand and the source mounting portion and the shielding element on the other hand along a second axis, which extends perpendicularly to the first axis.