Electron Microscope R-Axis Mask Position Adjustment
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Solution Overview
Problem
The existing methods for adjusting the mask position in cross-section milling, particularly for small processing objects, face difficulties due to the limitations of optical microscope-based alignment and the heat generation issues associated with infrared-based battery charging in electron microscopes, which hinder high-accuracy adjustments without introducing a heat source.
Innovation Solution
The use of the R-axis of an electron microscope's sample stage for precise mask position adjustment, allowing for high-accuracy alignment while performing observations, substitutes raster rotation to control the mask position without requiring a heat source.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If optical microscope is used for mask position adjustment, then adjustment can be performed, but adjustment precision is insufficient for small processing objects
Solution Approach 1:
The patent introduces an intermediary mechanism (the R-axis rotation mechanism) that connects the mask position adjustment to the existing electron microscope observation system. By rotating the R-axis, the mask position is adjusted indirectly through a coordinated movement system, allowing high-precision adjustment without requiring direct visual measurement tools.
Solution Approach 2:
The patent replaces the optical microscope-based mechanical adjustment system with an electronically controlled R-axis rotation system. This substitution eliminates the need for optical measurement tools and their associated precision limitations, using instead the electron microscope's own coordinate system and control mechanisms.
2Ease of operation
If infrared sensor and battery are provided in mask position adjustment mechanism, then wireless control is enabled, but heat generation occurs due to infrared ray absorption
Solution Approach 1:
The patent extracts and removes the battery and infrared sensor components from the mask adjustment mechanism. By eliminating these components, the system achieves wireless control through alternative means (using the electron microscope's existing control systems) without the heat generation problem caused by infrared ray absorption in the sample chamber.
Solution Approach 2:
The patent uses the electron microscope's existing control systems and coordinate transformation mechanisms as intermediaries to enable mask position adjustment. This intermediary approach provides wireless or remote control capability without requiring infrared communication, thus avoiding heat generation in the sample chamber.
3Manufacturing precision
If mask position adjustment is performed with high accuracy requirement, then cross-section milling precision improves, but adjustment time and complexity increase
Solution Approach 1:
The patent enables the system to perform self-alignment and self-adjustment by utilizing the electron microscope's own coordinate system and observation capabilities. The R-axis rotation mechanism automatically coordinates with the electron microscope's stage movements, allowing the system to achieve high-precision mask positioning without requiring extensive manual adjustment time or external measurement tools.
Solution Approach 2:
The patent makes the electron microscope's R-axis mechanism serve multiple functions: both for sample observation/positioning and for mask position adjustment. This multi-functionality eliminates the need for separate adjustment mechanisms and reduces adjustment time by utilizing the already-calibrated coordinate system of the electron microscope.
Data Source
AI summary
The present invention relates to adjustment of a mask position by driving an R-axis of an electron microscope in order to adjust the mask position with high accuracy while performing observation by the electron microscope without providing a heat generation source inside the electron microscope. The R-axis originally exists in a sample chamber of the electron microscope, which enables control with high accuracy. The R-axis driving of a sample stage can be substituted by raster rotation, therefore, the mask position can be adjusted with high accuracy while performing observation by the electron microscope according to the present invention.