Embedded Die Substrate on Interposer for Fine-Pitch Routing Yield

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Solution Overview

Problem

Conventional processes for manufacturing embedded die substrates in microelectronic devices suffer from inconsistencies and yield losses due to variations in bump height and die thickness, exacerbated by reduced bump pitch scaling and increased lateral dimensions, leading to integration complications.

Innovation Solution

The proposed solution involves forming a microelectronic device with an embedded die substrate on an interposer, eliminating most transverse routing layers and allocating redistribution functionality to the interposer, using a single transverse routing layer in the substrate and vertical through contacts, such as through silicon vias, to improve manufacturing yield and dimensional control.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If conventional buildup processes with multiple transverse routing layers are used, then routing functionality is provided, but manufacturing precision deteriorates due to variations in bump height and die thickness

Engineering Contradiction:
Improverouting functionalityVSAvoidbump height variation
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent extracts and removes most transverse routing layers from the substrate, retaining only a single transverse routing layer. This simplification eliminates the cumulative manufacturing variations that occur with multiple lamination and metallization steps, thereby improving bump height consistency while still providing necessary routing functionality through the reduced layer count.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent segments the routing functionality by allocating it primarily to the interposer rather than the substrate. This division allows the substrate to focus on providing mechanical support and minimal routing, while the interposer handles complex redistribution, thereby improving overall manufacturing precision and yield.

Inventive Principle:
Principle #1Segmentation

2Adaptability or versatility

If multiple embedded die are integrated in the substrate, then functionality is enhanced, but device complexity increases leading to integration complications

Engineering Contradiction:
Improvedie countVSAvoidintegration complexity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The interposer serves as an intermediary between multiple embedded die and the external environment. It provides a standardized interface and routing layer that simplifies the integration of multiple die with different functions and configurations, thereby enhancing versatility without proportionally increasing device complexity.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Area of moving object

If bump pitch scaling is reduced, then device density is improved, but manufacturing precision deteriorates due to increased sensitivity to variations

Engineering Contradiction:
Improvedevice densityVSAvoiddimensional control
Core Design Contradiction:
Area of moving objectVSManufacturing precision

Solution Approach 1:

By removing most transverse routing layers and their associated manufacturing steps, the patent reduces the cumulative sources of dimensional variation. This simplification is particularly beneficial for fine-pitch applications where even small variations can cause defects, thereby maintaining high device density while improving dimensional control.

Inventive Principle:
Principle #2Taking out (Extraction)

Data Source

PatentUS20260018529A1Microelectronic device with embedded die substrate on interposer
Publication Date: 2026.01.15 INTEL CORP
  • US20260018529A1 patent drawing
  • US20260018529A1 patent drawing
  • US20260018529A1 patent drawing

AI summary

A microelectronic device is formed to include an embedded die substrate on an interposer; where the embedded die substrate is formed with no more than a single layer of transverse routing traces. In the device, all additional routing may be allocated to the interposer to which the embedded die substrate is attached. The embedded die substrate may be formed with a planarized dielectric formed over an initial metallization layer supporting the embedded die.