Embedded Gate Graphene Device for Low Voltage Operation
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Solution Overview
Problem
The manufacturing process of graphene devices is complex and affects the properties of graphene, particularly due to low coupling between the oxide layer and the global back gate, leading to increased operation voltage and complicated processes.
Innovation Solution
A graphene device with an embedded gate on a substrate, an upper oxide layer, and electrodes on the graphene channel, along with an insulating layer and metal patterns, allowing for simpler manufacturing and improved control without altering the graphene properties, and a method involving forming embedded gates, oxide layers, and electrodes to create a graphene inverter.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a global back gate is formed on the oxide layer, then the device can be operated, but the coupling between the oxide layer and the global back gate is low, leading to increased operation voltage
Solution Approach 1:
The patent divides the gate structure into multiple embedded gates positioned at different locations beneath the graphene channel, rather than using a single global back gate. This segmentation allows each embedded gate to provide localized coupling, improving overall gate effectiveness and reducing the voltage required for device operation.
Solution Approach 2:
The patent introduces an embedded gate structure as an intermediary element between the control electrode and the graphene channel. This embedded gate is positioned in close proximity to the channel, providing strong coupling and effective control with lower voltages, thereby acting as a mediator that enhances the interaction between the control signal and the channel.
2Ease of manufacture
If the processes of forming the oxide layer and a gate electrode on the oxide layer are used, then the device can be manufactured, but the manufacturing process becomes complicated and the properties of graphene may change
Solution Approach 1:
The patent forms the embedded gates and positions them beneath the graphene channel before the final device assembly steps. This preliminary action allows the graphene to be transferred onto the pre-prepared embedded gate structure, simplifying the overall manufacturing process and avoiding complex post-graphene processing steps that could alter graphene properties.
Solution Approach 2:
Instead of forming the gate electrode on top of the oxide layer as in conventional structures, the patent inverts the approach by embedding the gates beneath the graphene channel. This inversion simplifies the manufacturing process as it eliminates the need for precise alignment and processing of gate electrodes on the oxide surface, while also preserving graphene properties.
Data Source
AI summary
The graphene device may include an upper oxide layer on at least one embedded gate, and a graphene channel and a plurality of electrodes on the upper oxide layer. The at least one embedded gate may be formed on the substrate. The graphene channel may be formed on the plurality of electrodes, or the plurality of electrodes may be formed on the graphene channel.