Embossed Paper Pattern Layout for Stronger Quilted Contrast
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Solution Overview
Problem
Existing embossed cellulosic fibrous structure products often have aesthetically unacceptable appearances due to interference between emboss and background patterns, which can distract from or distort the emboss pattern, compromising the product's visual appeal and functional qualities like softness, absorbency, and strength.
Innovation Solution
A fibrous structure product with a repeating pattern comprising a master pattern of embossments and a background pattern, where the background pattern is repeated at a frequency greater than 1.5 times that of the master pattern, optimizing their alignment to enhance the emboss appearance without interfering with each other, thereby creating a visually appealing quilted effect.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Shape
If an emboss pattern is applied to the cellulosic fibrous structure, then the quilted appearance and three-dimensional effect are improved, but the background pattern may interfere with or distort the emboss pattern, reducing aesthetic quality
Solution Approach 1:
The patent applies different pattern characteristics to different spatial locations and scales. The emboss pattern uses larger geometric shapes (circles, squares, triangles) with lower frequency, while the background pattern uses smaller shapes with higher frequency. This local differentiation in pattern properties allows both patterns to coexist without significant interference, as each operates at a distinct visual scale.
Solution Approach 2:
The background pattern is applied first to the cellulosic fibrous structure, establishing a base layer of visual texture. Subsequently, the emboss pattern is applied over this background, creating a layered effect where the emboss features stand out prominently. This sequential application ensures that the emboss pattern remains the dominant visual element while the background provides subtle enhancement.
2Shape
If multiple emboss patterns are used to enhance aesthetic appeal, then the visual quality is improved, but the complexity of pattern alignment and registration increases
Solution Approach 1:
The patent employs asymmetric distribution of pattern elements within each repeating unit. The emboss patterns feature geometric shapes positioned at non-uniform intervals and orientations, while the background pattern uses similarly asymmetric arrangements. This asymmetry prevents predictable interference patterns and reduces the visual impact of minor misalignments, simplifying the overall pattern registration requirements.
Solution Approach 2:
The patent resolves pattern alignment complexity by operating the emboss and background patterns at different spatial frequencies and scales. The emboss pattern uses larger features with lower frequency repetition, while the background pattern uses smaller features with higher frequency repetition. This dimensional separation in frequency space allows independent optimization of each pattern without requiring precise synchronization between them.
3Shape
If the background pattern frequency is increased to reduce interference, then the emboss pattern visibility is improved, but the risk of creating a distracting or camouflaging effect increases
Solution Approach 1:
The patent systematically varies key parameters of both patterns to achieve optimal visual效果. The emboss pattern uses geometric shapes with specific size ranges and spacing intervals, while the background pattern uses different shape sizes and densities. By carefully controlling parameters such as pattern frequency, amplitude, and spatial distribution, the patent enhances emboss visibility while preventing the background from becoming distracting or camouflaging.
Solution Approach 2:
The background pattern is designed with moderate frequency and amplitude characteristics that provide sufficient visual separation from the emboss pattern without becoming dominant. The background uses smaller, more densely packed elements that fill spaces between emboss features, providing a subtle textural base that enhances rather than competes with the primary emboss pattern. This partial action approach ensures the background supports the emboss features without creating interference.
Data Source
AI summary
A ply of fibrous structure product comprises a background pattern and a repeating pattern disposed on a portion of the background pattern. The repeating pattern comprises a master pattern comprising a first individual embossment comprising a major axis and a minor axis, a first line segment axis parallel to the major axis of the first individual embossment, and at least one individual embossment adjacent to the first individual embossment The individual embossment adjacent to the first individual embossment comprises a major axis and a minor axis. The major axis of the individual embossment adjacent to the first individual embossment and the first line segment axis form an angle of from about 0.5° to about 20°.