Embroidery Sewing Machine Dynamic Reference Adjustment
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Solution Overview
Problem
Existing sewing machines with embroidery frames lack flexibility in setting or changing references for positioning patterns larger than the sewable area, limiting user control over the layout relationship between divided patterns.
Innovation Solution
A sewing machine equipped with an image capturing device and a computer program that allows users to set and change references for pattern positioning by capturing images of markers on the sewing target object, identifying their positions and angles, and adjusting the layout accordingly, enabling flexible arrangement of patterns within a wider range than the sewable area.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If references for positioning patterns are set in advance to ensure accurate sewing, then sewing accuracy is improved, but user flexibility in setting or changing references is lost
Solution Approach 1:
The reference setting system transitions from a static pre-set configuration to a dynamic adjustable system. Users can now change references during the sewing process by capturing images of markers at different positions, allowing the reference frame to be dynamically updated while maintaining positioning accuracy through image processing and coordinate transformation.
Solution Approach 2:
The system incorporates feedback through image capture and processing. After users adjust the work cloth or change pattern positions, the system captures images of markers, processes them to determine new marker layouts, and automatically updates the reference frame accordingly, ensuring continuous positioning accuracy while accommodating user flexibility.
2Device complexity
If the sewable area is limited to the embroidery frame size, then device complexity is reduced, but the ability to sew larger patterns is restricted
Solution Approach 1:
The sewing process is segmented into multiple operations. Instead of requiring a single large sewable area, the system divides the pattern into multiple sections that can be sewn sequentially at different positions. Users can adjust the work cloth between patterns, and the system tracks their positions through marker images to maintain continuity across segmented sewing operations.
Solution Approach 2:
The system adds a dimensional aspect by allowing reference frames to be established in different spatial positions. Through image capturing and processing, the system creates a three-dimensional understanding of marker positions and work cloth transformations, enabling pattern placement beyond the physical limits of the embroidery frame while maintaining accurate positioning through coordinate transformations.
3Productivity
If automatic positioning is performed based on fixed markers, then sewing efficiency is improved, but user adaptability to different layout requirements is reduced
Solution Approach 1:
The positioning system becomes dynamic by allowing users to change marker positions and reference frames during the sewing process. The system automatically processes new marker images, calculates transformed coordinates, and updates positioning information, thereby maintaining high sewing efficiency while enabling flexible layout adjustments according to user needs.
Solution Approach 2:
The system changes positioning parameters by processing new marker images and calculating transformed coordinates based on different reference frames. Users can modify marker positions, adjust reference frames, and the system automatically updates all positioning parameters accordingly, allowing flexible layout requirements to be met while maintaining automated positioning efficiency.
Data Source
AI summary
A sewing machine that includes a first reference setting portion setting, as a first reference, a reference for a first pattern sewn in a first holding position, a first layout identification portion identifying, as a first marker layout, a marker for the first reference, a first reference change portion changing the first reference after the first marker layout is identified, a second layout identification portion identifying, as a second marker layout, a marker for the changed first reference, a second reference setting portion setting, as a second reference, a reference for a second pattern sewn in a second holding position, a third layout identification portion identifying, as a third marker layout, a marker for the first reference in the second holding position or the changed first reference, and a setting portion setting the second pattern for the sewing target object in the second holding position.