Emissivity-Controlled Gas Diffuser Plate for Uniform Deposition
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Solution Overview
Problem
In semiconductor manufacturing, the scaling of semiconductor devices leads to challenges in achieving uniform thin film deposition due to non-uniform precursor distribution and temperature fluctuations caused by radiosity between the diffuser plate and the wafer, resulting in reduced productivity and film quality.
Innovation Solution
A gas diffuser plate with a double-layer coating is introduced, where the emissivity-controlling layer, composed of titanium nitride oxide (TiNxOy), is used to modulate the emissivity of the diffuser plate to match that of the deposited material, and an anti-contamination layer, such as yttrium aluminum garnet (YAG) or Al2O3, is applied to reduce particle contamination and corrosion resistance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional substrate diffuser plate is used, then the structure is simple and easy to manufacture, but the emissivity is non-uniform causing temperature fluctuations and reduced film deposition uniformity
Solution Approach 1:
The diffuser plate is coated with a composite thin film structure consisting of multiple layers including emissivity-controlling layers (e.g., TiNxOy) and corrosion-resistant layers (e.g., YAG, Al2O3). This composite coating structure enables simultaneous control of emissivity for temperature stabilization and corrosion resistance, achieving uniform film deposition while maintaining manufacturing simplicity.
Solution Approach 2:
The emissivity of the diffuser plate is modified by changing the optical parameters of the coating material. By selecting materials with specific emissivity values (e.g., TiNxOy with controllable N/O ratio), the radiosity is adjusted to match the emitted material's emissivity, thereby stabilizing temperature fluctuations and improving film uniformity.
2Stability of the object's composition
If the diffuser plate emissivity is increased to reduce radiation emission, then temperature stability improves, but the material becomes more susceptible to corrosion from cleaning gases
Solution Approach 1:
A multi-layer composite coating is applied to the diffuser plate, combining emissivity-controlling materials (TiNxOy) with corrosion-resistant materials (YAG, Al2O3). The corrosion-resistant layer is positioned as the outermost layer to protect against cleaning gas corrosion, while the emissivity-controlling layer beneath it maintains temperature stability.
Solution Approach 2:
Different layers of the coating serve different local functions: the inner layer (TiNxOy) provides emissivity control for thermal management, while the outer layer (YAG/Al2O3) provides corrosion resistance for chemical protection. This functional differentiation allows each layer to optimize its specific property without compromising the other.
3Ease of manufacture
If a single-layer coating is applied to control emissivity, then the manufacturing process is simpler, but particle contamination from corrosion increases
Solution Approach 1:
A two-layer coating structure is implemented where the first layer (TiNxOy) controls emissivity and the second layer (YAG or Al2O3) provides corrosion resistance. This composite structure prevents particle contamination by protecting the substrate and first layer from corrosive cleaning gases, while the deposition process remains manageable through sequential layer formation.
4Manufacturing precision
If the diffuser plate is cleaned to remove contamination, then film quality improves, but particle generation from corrosion increases
Solution Approach 1:
The corrosion-resistant layer (YAG or Al2O3) is applied beforehand as a protective barrier against cleaning gases. This pre-established protective layer prevents direct contact between corrosive cleaning agents and the underlying substrate or emissivity-controlling layer, thereby reducing particle generation during cleaning processes while maintaining film quality.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution stabilizes the process temperature, reduces radiation emission, and enhances the uniformity of thin film deposition, thereby increasing productivity and film quality by minimizing process drift and particle contamination.
Implementation Method 1
the emissivity-controlling layer, composed of titanium nitride oxide (TiNxOy), is used to modulate the emissivity of the diffuser plate to match that of the deposited material, and an anti-contamination layer, such as yttrium aluminum garnet (YAG) or Al2O3, is applied to reduce particle contamination and corrosion resistance
Implementation Method 2
the first layer of the first material is deposited by a method comprising plasma enhanced chemical vapor deposition (PECVD) process or magnetron sputtering
Implementation Method 3
the first layer of the first material is deposited by a method comprising plasma enhanced chemical vapor deposition (PECVD) process or magnetron sputtering
Implementation Method 4
the second material is deposited by a method comprising atomic layer deposition (ALD)
Data Source
AI summary
A gas diffuser plate in a cyclic deposition chamber is disclosed. The gas diffuser plate as fabricated comprises a substrate diffuser plate having a substrate emissivity and a coating formed on the substrate diffuser plate. The gas diffuser plate having the substrate diffuser plate coated with the coating has an emissivity higher than the substrate emissivity. The coating comprises a first layer formed on the substrate diffuser plate and comprising a first material configured to modulate the emissivity of the gas diffuser plate, and a second layer comprising a second corrosion-resistant material. The first material comprises titanium nitride oxide (TiNxOy). The emissivity of the gas diffuser plate is at least partially based on the ratio of nitrogen and oxygen in TiNxOy.