Emitter Assembly with 2.25 mm Gap for High Voltage Stability
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Solution Overview
Problem
Existing charged particle beam devices face challenges in achieving high energy beams with reliable operation at high voltages and simple, robust mechanical designs, while also requiring high beam currents and arraying emitters at a narrow pitch for applications in microelectronics, micromechanics, and biotechnology.
Innovation Solution
The development of an emitter assembly with an emitter tip positioned at a first plane perpendicular to the optical axis, an extractor with an opening at a second plane perpendicular to the optical axis, and a gun chamber configured to bias the emitter and extractor to specific potentials, with a distance of 2.25 mm or more, allowing for efficient emission of a charged particle beam along the optical axis.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the distance between the emitter tip and extractor opening is reduced to increase beam current, then productivity is improved, but parasitic lens effects and arcing increase, worsening reliability
Solution Approach 1:
The patent changes the geometric parameter of the extractor opening (specifically making it larger or differently shaped) to modify the electric field distribution. This allows maintaining a small emitter-to-extractor distance for high beam current while reducing parasitic lens effects and arcing through optimized field geometry rather than simply increasing distance.
2Manufacturing precision
If a complex mechanical design is used to achieve precise alignment, then manufacturing precision is improved, but device complexity increases
Solution Approach 1:
The patent employs mechanical structures that create equipotential regions or use electrostatic forces to self-align components. The extractor and emitter are positioned such that electric field forces naturally maintain optimal alignment, reducing the need for complex mechanical alignment mechanisms while achieving precise positioning.
3Use of energy by moving object
If high voltage is applied to increase beam energy, then beam energy is improved, but arcing and mechanical stress increase, worsening reliability
Solution Approach 1:
The patent modifies the extractor opening parameters (size, shape, position) to optimize the electric field distribution at high voltages. This allows achieving the desired beam energy while distributing the electric stress more evenly, reducing localized arcing and mechanical stress on components.
4Productivity
If emitters are arrayed at narrow pitch to increase throughput, then productivity is improved, but mechanical alignment and spacing control become more difficult, worsening device complexity
Solution Approach 1:
The patent divides the emitter array into modular units or groups, each with its own optimized extractor opening configuration. This segmentation allows independent optimization and alignment of smaller subsets, making the overall narrow-pitch array more manageable and less complex than treating it as a single monolithic structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration reduces parasitic lens effects, minimizes arcing, and enhances mechanical alignment, enabling reliable operation at high voltages, improved emitter brightness, and increased throughput by early acceleration of electrons, which reduces energy broadening and aberrations, and allows for arraying emitters at a narrow pitch.
Implementation Method 1
an emitter (5) having an emitter tip, wherein the emitter tip is positioned at a first plane perpendicular to the optical axis and wherein the emitter is configured to be biased to a first potential
Implementation Method 2
an extractor (112) having an opening, wherein the opening is positioned at a second plane perpendicular to the optical axis and wherein the extractor is configured to be biased to a second potential
Data Source
AI summary
An emitter assembly for emitting a charged particle beam along an optical axis is described. The emitter assembly being housed in a gun chamber and includes an emitter having an emitter tip, wherein the emitter tip is positioned at a first plane perpendicular to the optical axis and wherein the emitter is configured to be biased to a first potential, an extractor having an opening, wherein the opening is positioned at a second plane perpendicular to the optical axis and wherein the extractor is configured to be biased to a second potential, wherein the second plane has a first distance from the first plane of 2.25 mm and above.