Emitter Tip Vibration Compensation in Charged Particle Beam Apparatus
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Solution Overview
Problem
Charged particle beam apparatuses face limitations in resolution due to mechanical vibrations of the emitter tip, particularly in the y-direction, which are not adequately stabilized by existing methods, especially in high-resolution applications requiring stability below 1 nanometer.
Innovation Solution
A charged particle beam apparatus incorporating an emitter location measuring device and a deflector system to repeatedly measure and compensate for variations in the emitter tip's location, using techniques such as contact-less measurement with laser beams and interferometry to detect vibrations and adjust the beam path accordingly.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional field-emission guns are used to achieve high brightness and resolution, then superior spatial resolution and brightness are obtained, but mechanical vibrations of the emitter tip significantly limit the achievable resolution
Solution Approach 1:
The patent implements a feedback control system where a laser beam measures the emitter tip position, and the measured vibrations are fed back to a compensation mechanism (electromagnetic lens or deflector) that generates counteracting signals to stabilize the tip position, thereby resolving the contradiction between achieving high resolution and maintaining tip stability
Solution Approach 2:
The patent introduces a laser beam as an intermediary measurement tool that non-contactly detects emitter tip vibrations, and introduces a compensation field (electromagnetic) as an intermediary that mediates between the measured vibrations and the required stabilization, enabling resolution improvement without direct mechanical intervention
2Stability of the object's composition
If the emitter configuration is made stiffer in the x-direction to reduce vibrations, then vibration amplitude is reduced, but this corresponds to higher order vibrational excitations with very high eigenfrequency that are strongly damped
Solution Approach 1:
The patent replaces mechanical stiffening approaches with an active stabilization system using electromagnetic fields. Instead of mechanically constraining the emitter to suppress vibrations, the system uses a laser measurement feedback loop combined with electromagnetic compensation fields to actively counteract vibrations, avoiding the complexity of high-order mechanical vibrational modes
3Stability of the object's composition
If additional support structures are added to stabilize the emitter tip, then mechanical stability is improved, but the device complexity and potential for additional vibrations increase
Solution Approach 1:
The patent uses a laser beam as an intermediary measurement tool that enables non-contact detection of tip position, eliminating the need for additional mechanical support structures. The measurement information is then used to control electromagnetic compensation fields, achieving stabilization without adding mechanical complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively compensates for emitter tip vibrations, enhancing the resolution of charged particle beam systems to achieve stability and precision in the nanometer range, thereby improving the performance of electron microscopes and other applications.
Implementation Method 1
using techniques such as contact-less measurement with laser beams and interferometry to detect vibrations
Implementation Method 2
a deflector system configured to compensate for variations in the location of the emitter
Data Source
AI summary
A charged particle beam apparatus with a charged particle beam source including an emitter with an emitter tip and a supporting member for supporting the emitter is provided. Further, the apparatus includes an emitter location measuring device for repeatedly measuring the location of the emitter and a deflector system for compensating variations in the location of the emitter.