Encapsulated Electromagnet Array for Plasma Chamber Ion Guidance
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Solution Overview
Problem
Sputter deposition into deep and narrow via holes with high aspect ratios is challenging due to the isotropic angular distribution of sputtered ions, leading to non-uniform coating of sidewalls and bottoms, and existing sputter equipment requires precision, ease of alignment, and cost-effectiveness.
Innovation Solution
An array of multiple electromagnetic coils is disposed around the plasma processing chamber, encapsulated in a plastic with a fluid cooling coil, and pre-wound into a mold with a curable resin to form a unitary body, providing precise control and cooling for improved ion guidance and uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If auxiliary magnets are placed along the sidewalls to confine and guide sputter ions, then the uniformity of ionized sputter processes is improved, but the device complexity and alignment difficulty increase
Solution Approach 1:
Multiple electromagnetic coils are encapsulated together in a single rigid support structure, merging multiple separate magnet components into one integrated assembly. This reduces the number of individual parts to be handled and aligned, while maintaining the uniform plasma confinement effect across the chamber
Solution Approach 2:
The electromagnetic coils are pre-positioned and fixed relative to each other within the rigid support structure before installation. This preliminary arrangement of components eliminates the need for complex on-site alignment procedures, reducing installation complexity while ensuring proper spatial configuration for uniform plasma control
2Measurement precision
If multiple electromagnetic coils are used to control plasma, then the control precision is improved, but the ease of manufacture and handling deteriorates
Solution Approach 1:
Multiple electromagnetic coils that would otherwise require separate manufacturing and assembly are combined into a single encapsulated unit. The rigid support structure integrates all coils into one manufacturable component, improving ease of manufacture while maintaining the precise multi-coil configuration needed for plasma control
Solution Approach 2:
The rigid support structure acts as a encapsulating shell that holds the electromagnetic coils in fixed positions. This shell structure provides mechanical support and precise positioning without requiring complex internal frameworks, simplifying both manufacture and handling while maintaining the geometric precision needed for plasma control
3Reliability
If electromagnetic coils are disposed around the chamber, then the plasma control effectiveness is improved, but the mechanical stability and deformation resistance worsens
Solution Approach 1:
A rigid support structure encapsulates the electromagnetic coils, providing mechanical stability and resistance to deformation. This shell structure protects the coil assembly from mechanical stresses while maintaining the precise geometric configuration necessary for effective plasma control
Solution Approach 2:
The electromagnetic coils are merged into a single rigid support structure, creating one mechanically stable assembly unit. This integration ensures that all coils maintain their relative positions and geometric relationships, preserving plasma control effectiveness while improving overall mechanical stability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances the uniformity of ionized sputter processes, reduces mechanical deformation, and allows for flexible configuration and easy handling of the electromagnet array, resulting in consistent and efficient sputtering of materials like Ta and Cu into high-aspect-ratio holes.
Implementation Method 1
auxiliary magnets are placed along the sidewalls of the sputter chamber to confine and guide the sputter ions
Implementation Method 2
one or more electromagnetic coils may be encapsulated in a plastic together with a fluid cooling coil
Implementation Method 3
fluid cooling coil
Data Source
AI summary
A electromagnet array structure including multiple electromagnetic coils captured in a rigid encapsulant, for example, of cured epoxy resin, to form a unitary free-standing structure which can be placed around the walls of a plasma processing chamber. A liquid cooling coil may also be captured in the encapsulant between the electromagnetic coils. The structure may additionally include water fittings, locating pins, through tubes for chamber bolts, and lifting brackets.