Epitaxial Susceptor Segmented Carrier Design
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Solution Overview
Problem
Existing epitaxial growth reactors face challenges in achieving high-quality substrate production with increased flexibility, productivity, and reduced maintenance, particularly in high-temperature silicon carbide processing, where manual handling and downtime are significant issues.
Innovation Solution
A susceptor design featuring a disc-shaped body with a raised edge and substrate supporting elements that can be coupled with a frame, allowing for permanent placement within the reaction chamber, enabling flexible handling and reducing the need for frequent susceptor replacement and maintenance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the susceptor is entirely made of graphite with manual insertion and extraction of substrates, then the structural simplicity and ease of manufacture are maintained, but the productivity and reactor downtime are reduced due to manual handling operations
Solution Approach 1:
The susceptor system is segmented into a permanent graphite susceptor body and removable substrate carriers. The carriers can be independently loaded and unloaded from the reaction chamber, allowing continuous operation while the main susceptor remains in place. This segmentation enables parallel operations of loading/unloading substrates without interrupting the epitaxial growth process.
Solution Approach 2:
Substrate carriers act as intermediary elements between the permanent susceptor and the substrates. These carriers simplify the handling process by providing a standardized interface for automatic loading and unloading mechanisms, eliminating the need for manual substrate manipulation and reducing reactor downtime.
2Ease of operation
If the susceptor is entirely made of graphite with manual handling, then the device complexity is low, but the ease of operation and handling flexibility are reduced
Solution Approach 1:
The susceptor system is divided into a permanent graphite body and removable substrate carriers with raised edges. The carriers are designed as simple, standardized components that can be easily manipulated by automatic handling mechanisms, providing operational flexibility without significantly increasing overall system complexity.
Solution Approach 2:
The substrate carriers are designed as simple, replaceable components that can be easily manufactured and disposed of after use. This approach simplifies the handling process by allowing quick replacement of carriers between substrate batches, enhancing ease of operation while keeping individual component complexity low.
3Manufacturing precision
If the susceptor is entirely coated with silicon carbide and used for high-temperature growth, then the manufacturing precision and substrate quality are improved, but the ease of repair and maintenance are worsened due to the permanent nature of the coating
Solution Approach 1:
The susceptor system separates the permanent silicon carbide-coated graphite body from the removable substrate carriers. The carriers can be easily removed and replaced if damaged or contaminated, while the expensive silicon carbide-coated susceptor body remains in place. This segmentation protects the investment in the coated susceptor while maintaining ease of maintenance through carrier replacement.
Solution Approach 2:
The substrate carriers serve as protective intermediaries between the substrates and the silicon carbide-coated susceptor surface. By placing substrates on carriers rather than directly on the coated surface, any contamination or damage affects only the carriers, which can be easily replaced, thereby protecting the expensive coated susceptor and simplifying maintenance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design enhances substrate handling and heating flexibility, increases reactor productivity by minimizing downtime, and simplifies maintenance by allowing for the susceptor to remain in the chamber during growth and easy unloading of treated substrates, thereby improving overall process efficiency and quality.
Implementation Method 1
the heating of the chamber and susceptor is generally obtained by means of electromagnetic induction or resistance
Implementation Method 2
the heating of the chamber and susceptor is generally obtained by means of electromagnetic induction or resistance
Implementation Method 3
Epitaxial growth and the reactors for obtaining it have been known for many decades; they are based on the technique known as 'CVD' (Chemical Vapor Deposition)
Data Source
AI summary
The present invention mainly relates to a susceptor for a reactor for epitaxial growth, comprising: a disc-shaped body (90) having a first face and a second face, wherein the first face comprises at least one zone (99) adapted to receive a substrate (2000) to be subjected to epitaxial growth and at least one supporting element (91+97) for the substrate (2000), located at the zone (99); the supporting element (91+97) comprises a circular disc (91) with an edge (97) which is raised with respect to the disc; the zone (99) may be a bottom of a recess (99) or a top of a relief of the disc-shaped body (90); the disc-shaped body (90) is solid at least at the recess (99) or relief; the edge is accessible from a side of the susceptor for handling the supporting element.