Epitaxy Template Design for Block Copolymer Lithography Placement Error
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Solution Overview
Problem
Current lithography methods face challenges in achieving precise placement and high resolution of nano-scale features on substrates, leading to defects and placement errors in self-assembled block copolymer patterns, which are critical for advanced device manufacturing.
Innovation Solution
A method is developed to design an epitaxy template using computer-aided optimization techniques, incorporating random error simulation to improve pattern fidelity statistics, allowing for accurate placement and reduced defects in self-assembled block copolymer patterns on substrates, thereby enhancing the precision of lithography features.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional lithography methods are used to pattern substrates, then manufacturing processes are well-established, but feature size reduction and placement precision are limited at nano-scale
Solution Approach 1:
The patent applies preliminary action by pre-patterning the substrate with an epitaxy template before block copolymer deposition. The template is designed with optimized geometries (e.g., rounded corners, adjusted pitch) that guide the self-assembly process to achieve precise feature placement and reduce defects, thereby improving manufacturing precision without requiring complex real-time control during polymerization.
2Manufacturing precision
If epitaxy templates are used to direct block copolymer self-assembly, then placement accuracy improves, but random errors and defects still occur in patterns
Solution Approach 1:
The patent applies parameter changes by systematically optimizing template design parameters such as feature pitch, corner radius, and geometry to account for and compensate for random errors during self-assembly. By adjusting these parameters, the template design achieves robustness against variations, improving pattern fidelity and reducing defect rates while maintaining placement accuracy.
3Area of moving object
If feature size is reduced to increase density, then substrate capacity increases, but placement errors and defects increase
Solution Approach 1:
The patent applies preliminary action by pre-designing epitaxy templates with optimized geometries specifically tailored for high-density nanoscale patterning. The templates incorporate features like rounded corners and adjusted pitch that guide block copolymer self-assembly to achieve precise placement even at reduced feature sizes, thereby enabling high feature density without sacrificing placement accuracy.
4Ease of manufacture
If standard epitaxy template designs are used, then manufacturing is simpler, but placement errors occur due to random errors in self-assembly
Solution Approach 1:
The patent applies parameter changes by optimizing template design parameters such as feature pitch, corner radius, and geometry to compensate for random errors during self-assembly. These optimized parameters are integrated into standard fabrication workflows, maintaining ease of manufacture while significantly improving placement precision and reducing placement errors in the final patterns.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The optimized epitaxy template design significantly improves the placement accuracy and pattern fidelity of self-assembled block copolymer patterns, reducing defects and ensuring precise alignment with target patterns, which is essential for advanced nanofabrication applications.
Implementation Method 1
A self-assemblable block copolymer is a compound useful in nanofabrication because it may undergo an order-disorder transition on cooling below a certain temperature (order-disorder transition temperature TOD) resulting in phase separation of copolymer blocks
Implementation Method 2
An example of a suitable block copolymer is, for instance, a polymer having covalently linked blocks of polystyrene (PS) monomer (hydrophobic block) and polymethylmethacrylate (PMMA) monomer (hydrophilic block)
Implementation Method 3
The self-assembly of the block copolymer may be directed by an epitaxy template with a pattern on a substrate
Data Source
AI summary
A method of designing an epitaxy template to direct self-assembly of a block copolymer on a substrate into an ordered target pattern involves providing a primary epitaxy template design and then varying the design to optimize a pattern fidelity statistic, such as placement error, relative to the target pattern by modelling predicted self-assembled block copolymer patterns and optimizing pattern placement as a function of a varied design parameter. In addition to varying a design parameter to optimize the pattern fidelity statistic, a random error in the template design is included prior to modelling predicted patterns in order to compensate for expected template inaccuracy in practice. The inclusion of a realistic random error in the template design, in addition to systematic variation of a design parameter, may improve the template design optimization to render the result less sensitive to error which may be inevitable in practice.