Electron Probe Microanalysis Calibration Using Atom Lithography Grating
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Solution Overview
Problem
Existing electron probe microanalysis instruments face challenges in achieving accurate calibration due to the limitations of standard materials and the complexity of nano length quantity value dissemination, leading to significant measurement errors and uncertainty in three-dimensional nanostructure characterization.
Innovation Solution
A method involving a one-dimensional grating standard template prepared using atom lithography technology is employed to calibrate the electron probe microanalysis instrument. This method calculates a theoretical grating period and uses it to determine a calibration factor, which is then used to correct parameters such as length measurement indication error and sample stage repeatability error.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional standard templates (500 nm, 10 μm) are used for calibration, then the calibration process is simple and familiar, but the measurement precision and calibration accuracy deteriorate due to large uncertainty (1.4 nm for 500 nm template, 10 nm for 10 μm template)
Solution Approach 1:
The patent introduces an atom lithography grating as an intermediary standard between conventional templates and the electron probe microanalysis instrument. This grating serves as a mediator that transfers the natural constant (atom spacing) to the instrument calibration, achieving high precision without requiring direct atomic resolution capability. The intermediary grating has known spacing based on atom lithography theory, providing a bridge that resolves the contradiction between accuracy and complexity.
Solution Approach 2:
The patent replaces the mechanical measurement system (laser interferometer calibration of gratings) with a theoretical calculation system based on atom lithography principles. Instead of mechanically measuring and calibrating each grating with interferometers, the grating spacing is determined by theoretical formulas based on atom deposition parameters, eliminating the complex mechanical traceability chain and reducing error accumulation.
2Measurement precision
If laser interferometer calibration is used for standard templates, then the calibration can be performed with existing equipment, but the measurement precision deteriorates due to error accumulation through multiple quantity value dissemination links
Solution Approach 1:
The patent extracts the critical calibration parameter (grating spacing) from the complex laser interferometer calibration process and replaces it with a theoretical value based on atom lithography. By taking out the need for intermediate calibration standards and their complex traceability chains, the patent directly links the instrument calibration to fundamental atomic constants, eliminating error accumulation while maintaining calibration capability.
Solution Approach 2:
The patent changes the basis of the grating spacing parameter from empirically measured values (requiring laser interferometer calibration) to theoretically calculated values based on atom lithography parameters. This parameter change transforms the calibration from a multi-link dissemination process to a direct calculation based on fundamental constants, improving consistency and reducing complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed method shortens the traceability chain, reduces error accumulation, improves calibration consistency, and enhances the accuracy of fusion measurements, thereby facilitating more precise characterization of sub-10 nm device structures.
Implementation Method 1
preparing a one-dimensional grating standard template based on atom lithography technology
Implementation Method 2
They use a finely focused electron beam to scan on a sample, and obtain a micro area surface topography image or a content value of an excited micro area element from a secondary electron signal, a backscattered electron signal, an X-ray of each element's characteristic wavelength and the like obtained from the electron beam/sample interaction
Data Source
AI summary
The present application discloses a method for calibrating a parameter error of an electron probe microanalysis instrument. A one-dimensional grating standard template is prepared based on atom lithography technology. A theoretical grating period D of the one-dimensional grating standard template is calculated. The one-dimensional grating standard template is statically placed on a stage of the electron probe microanalysis instrument. The electron probe microanalysis instrument scans the one-dimensional grating standard template on the stage, performs image acquisition and measurement on a grid distance of the one-dimensional grating standard template to obtain a grating scanning distance measurement value L, and records a magnification ratio at this time. A calibration factor K under the magnification ratio is calculated according to D and L. The present application shortens the length of the traceability chain for calibrating the instrument, reduces the error accumulation in the quantity value dissemination process.