Electrostatic Chuck Helium Line Multilumen Plug Against Arcing
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Solution Overview
Problem
High RF power in plasma processing chambers leads to electrical discharges (arcing) between the wafer and baseplate or ignition of heat transfer gas (He) in plasma processing chambers, causing damage to the electrostatic chuck (ESC) and disrupting semiconductor manufacturing processes.
Innovation Solution
A spark suppression apparatus is introduced, featuring a dielectric multilumen plug in the helium line of the ESC, which compartmentalizes the helium flow into smaller volumes, reducing charged particle collisions and preventing direct line of sight between the wafer and metal parts, while maintaining necessary helium flow for cooling.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If high RF power is used for plasma formation, then plasma processing capability is improved, but electrical discharges (arcing) occur between wafer and baseplate or ignition of heat transfer gas
Solution Approach 1:
The patent divides the helium flow path into multiple smaller channels using a multilumen plug structure. This segmentation prevents direct line-of-sight paths for electron acceleration, thereby reducing arcing while maintaining the necessary cooling function. The plug contains 30 to 100,000 lumens with widths of 1 to 200 microns, creating a tortuous path that blocks harmful electrical discharges.
Solution Approach 2:
The dielectric multilumen plug acts as an intermediary component inserted into the helium cooling line. It mediates between the high voltage plasma environment and the cooling system, preventing direct electrical discharge paths while allowing thermal conduction and helium flow to continue. The dielectric material provides electrical isolation while maintaining thermal coupling.
2Duration of action of stationary object
If dielectric multilumen plug is inserted in helium line, then arcing is reduced and ESC utilization time is extended, but device complexity increases
Solution Approach 1:
The multilumen plug performs multiple functions simultaneously: it provides electrical insulation to prevent arcing, maintains thermal conduction for cooling, and allows helium flow through its lumens. This multi-functionality justifies the added complexity by delivering multiple benefits from a single component insertion.
Solution Approach 2:
The patent uses a porous or multilumen structure that allows fluid (helium) to pass through while providing electrical insulation. The porous/multilumen architecture enables thermal conduction and gas flow while blocking direct electrical discharge paths, combining multiple desirable properties in one material structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces arcing and extends the utilization time of the ESC, minimizing damage to wafers and other chamber components, thereby improving manufacturing efficiency and reducing production losses.
Implementation Method 1
Radio frequency (RF) power used for forming a plasma may cause a secondary plasma light-up in the ESC cavities due to high voltage associated with plasma formation. The light-up would promote arcing between any two surfaces with a high electric potential difference between them.
Implementation Method 2
In various plasma processing chambers, helium (He) is flowed to a backside of a substrate on an electrostatic chuck (ESC) in order to provide temperature control.
Data Source
AI summary
A spark suppression apparatus for a helium line in an electrostatic chuck in a plasma processing chamber is provided. The spark suppression apparatus comprises a dielectric multilumen plug in the helium line, wherein the dielectric multilumen plug has a plurality of lumens, wherein the plurality of lumens are numbered between 30 to 100,000 lumens and have a width of between 1 micron and 200 microns.