ESD Protection Circuit with RC-Triggered PMOS for High Voltage Latch-Up Prevention

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Solution Overview

Problem

Existing ESD protection circuits in semiconductor technology face challenges in high voltage applications, where SCR or NMOS-based circuits may cause latch-up failures due to insufficient holding voltage, and RC triggered PMOS transistors consume excessive die area.

Innovation Solution

The proposed ESD protection circuit incorporates a high voltage P type implanted region and a High Voltage N Well, forming a Zener diode and bipolar PNP transistor in series connection, which provides a higher breakdown voltage and efficient current path, and can also include a reverse diode and SCR in series for enhanced protection.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of stationary object

If SCR or NMOS based ESD protection circuits are used in high voltage applications, then the die area is reduced, but latch-up failure occurs due to insufficient holding voltage

Engineering Contradiction:
Improvedie areaVSAvoidlatch-up failure
Core Design Contradiction:
Area of stationary objectVSReliability

Solution Approach 1:

The patent changes the voltage parameter characteristics by using a RC-triggered PMOS transistor configuration that provides a holding voltage greater than 5V, compared to the conventional SCR or NMOS circuits that have insufficient holding voltage. This parameter change resolves the latch-up failure issue while maintaining compact die area.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent employs a dynamic triggering mechanism using an RC circuit that activates the PMOS transistor only when needed (during ESD events). The circuit transitions from a high-impedance state to a low-impedance discharge path dynamically, providing high holding voltage only when required, thus avoiding latch-up failures.

Inventive Principle:
Principle #15Dynamics

2Reliability

If RC triggered PMOS transistor is used to achieve high holding voltage, then latch-up failure is prevented, but die area consumption increases

Engineering Contradiction:
Improveholding voltageVSAvoiddie area
Core Design Contradiction:
ReliabilityVSArea of stationary object

Solution Approach 1:

The RC-triggered PMOS transistor serves multiple functions: it acts as a voltage regulator to maintain holding voltage above 5V, provides ESD discharge path, and prevents latch-up failures. This multi-functionality allows achieving high reliability without proportionally increasing die area, as a single transistor performs multiple protective roles.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The patent applies the RC-triggered PMOS configuration specifically at critical I/O pads where ESD protection is most needed, rather than uniformly across the entire chip. This localized application optimizes the holding voltage provision while minimizing overall die area consumption.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration offers a reliable ESD protection with a higher breakdown voltage and optimized semiconductor die size, effectively preventing damage from voltage spikes and ensuring the internal circuits are protected.

Implementation Method 1

provides a higher breakdown voltage

Methodology Applied
Scientific EffectBreakdown voltage: Avalanche Breakdown

Implementation Method 2

Electrostatic Discharge (ESD) is a rapid discharge that flows between two objects due to the built-up of static charge

Methodology Applied
Scientific EffectElectrostatic discharge: Electrostatic Discharge

Data Source

PatentUS9318480B2Electrostatic discharge protection circuit
Publication Date: 2016.04.19 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US9318480B2 patent drawing
  • US9318480B2 patent drawing
  • US9318480B2 patent drawing

AI summary

A device comprises a high voltage N well and a high voltage P well over an N+ buried layer, a high voltage P-type implanted region in the high voltage N well, a first N+ region over the high voltage P-type implanted region and a P+ region and a second N+ region over the high voltage P well.