Etch Stopper Layers for Color Filter Film Thickness Control
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Solution Overview
Problem
The challenge in manufacturing display devices is achieving uniform film thicknesses of interference layers for color filters on an array substrate, as variations in etching amounts during the dry etching process lead to inconsistencies in the plane, making it difficult to maintain precise control over the film thicknesses for red, green, and blue color filters.
Innovation Solution
The implementation of etch stopper layers selectively formed in specific regions to prevent interference layers from being shaved during the dry etching process, allowing for precise control of film thicknesses by using these layers as masks during the etching process, ensuring uniformity across the array substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If half etching of dry etching process is used to control film thicknesses of interference layers, then the color filters can be formed with different wavelengths, but variation in etching amount causes non-uniform film thicknesses in the plane of the array substrate
Solution Approach 1:
Etch stopper layers are formed at predetermined positions before the dry etching process. These stopper layers act as masks that prevent etching from penetrating too deeply, ensuring that the interference layers achieve the desired uniform thickness. By preparing these protective layers in advance, the patent prevents the etching variation problem before it occurs during the actual etching process.
Solution Approach 2:
The etch stopper layers serve as intermediary elements between the etching process and the interference layers. These intermediate layers control the etching depth by acting as physical barriers, mediating the interaction between the etching plasma and the interference layer material, thereby ensuring uniform thickness without directly affecting the optical properties of the color filters.
2Manufacturing precision
If etch stopper layers are selectively formed to prevent interference layers from being shaved, then film thickness control is improved, but the manufacturing process becomes more complex
Solution Approach 1:
The formation of etch stopper layers is merged with the existing film deposition process. The stopper layers are deposited using the same thin-film deposition equipment and processes already in place for creating the interference layers, thereby integrating the precision control function into the existing manufacturing workflow without requiring entirely new process equipment or facilities.
Solution Approach 2:
The patent controls the thickness and material composition parameters of the etch stopper layers to optimize their protective function. By carefully selecting the stopper layer thickness (typically thinner than the interference layers) and material properties, the process achieves precise film thickness control while minimizing the additional process complexity. The parameters are tuned so that the stopper layers provide sufficient protection without requiring multiple complex processing steps.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables precise control of film thicknesses for color filters, leading to improved uniformity and the production of high-definition display devices with enhanced light transmission and reflection characteristics.
Implementation Method 1
When the control of the film thicknesses of the interference layers in the stack structure is performed by the half etching of a dry etching process
Data Source
AI summary
A high definition display device is provided. The display device includes an array substrate, and an opposing substrate. The array substrate has a substrate, and on the substrate, a first pixel having a first color filter and a second pixel having a second color filter disposed adjacent to the first pixel. Each of the first color filter and the second color filter has a first dielectric layer, a transmissive layer disposed on the first dielectric layer, and a second dielectric layer disposed on the transmissive layer. The transmissive layer of the first color filter has a first film thickness, and the transmissive layer of the second color filter has a second film thickness larger than the first film thickness. On the transmissive layer of the second color filter, a first layer different from the transmissive layer is disposed on a side of the transmissive layer of the first color filter. A height of a bottom face of the first layer is equal to the first film thickness.