Etched Multilayer Graphene for Faster Uniform Intercalation Doping

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Solution Overview

Problem

Current intercalation doping processes for large-area multi-layered graphene sheets are time-consuming and inefficient due to slow diffusion mechanisms, particularly when confined to the edges of the sheets, which limits the conductivity enhancement and uniformity of doping.

Innovation Solution

Introducing engineered pathways or openings on the graphene sheets through etching, allowing intercalants to diffuse through both edges and etched regions, significantly accelerating the doping process and enhancing efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If intercalation doping is performed through edge diffusion only, then the doping process is simpler to implement, but the doping time is excessively long and efficiency is low

Engineering Contradiction:
Improvedoping process simplicityVSAvoiddoping efficiency
Core Design Contradiction:
Ease of manufactureVSProductivity

Solution Approach 1:

The patent segments the graphene sheet into multiple regions by introducing etched openings, transforming the single edge-diffusion pathway into multiple distributed diffusion channels. This segmentation allows intercalants to access different regions of the graphene simultaneously, dramatically reducing the overall doping time while maintaining process simplicity.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent transitions from one-dimensional edge diffusion to two-dimensional surface diffusion by creating etched openings across the graphene surface. This dimensional change provides additional diffusion pathways through the openings, enabling intercalants to reach internal regions much faster than through edge diffusion alone.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Device complexity

If intercalation doping is performed through edge diffusion only, then the process requires fewer process steps, but the doping uniformity across large areas is poor

Engineering Contradiction:
Improveprocess stepsVSAvoiddoping uniformity
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

By dividing the large-area graphene into multiple smaller regions through etched openings, the patent ensures that each region receives uniform dopant distribution. The segmented structure eliminates the gradient effects inherent in edge-only diffusion, achieving consistent doping across the entire large-area substrate.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent applies local quality by creating etched openings at specific locations and densities across the graphene surface. This localized modification allows tailored diffusion pathways in different regions, ensuring uniform doping distribution while maintaining overall process simplicity.

Inventive Principle:
Principle #3Local quality

3Area of stationary object

If the graphene sheets are large-area, then the coverage and application potential are improved, but the diffusion time for intercalants increases significantly

Engineering Contradiction:
Improvegraphene coverage areaVSAvoidintercalation time
Core Design Contradiction:
Area of stationary objectVSLoss of time

Solution Approach 1:

The patent solves the scaling problem by introducing vertical diffusion pathways through etched openings. This allows intercalants to access the graphene interior through multiple distributed openings rather than traveling long distances along edges, enabling rapid doping of large-area substrates.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The etched openings create a porous structure in the graphene sheet, providing numerous diffusion channels for intercalants. This porous architecture dramatically reduces diffusion distances and enables rapid, uniform doping across large areas without increasing process complexity.

Inventive Principle:
Principle #31Porous materials

4Ease of manufacture

If conventional intercalation doping is used, then no additional processing steps are needed, but the conductivity enhancement is insufficient and time-consuming

Engineering Contradiction:
Improveprocessing stepsVSAvoidconductivity enhancement
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The patent performs preliminary action by etching openings in the graphene before the intercalation doping step. This pre-prepared structure enables rapid dopant diffusion during the subsequent intercalation process, achieving superior conductivity enhancement without adding significant process complexity.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

By creating a porous structure with etched openings, the patent dramatically accelerates dopant diffusion and achieves thorough, uniform doping. This results in significant conductivity enhancement while maintaining ease of manufacture through integration with standard fabrication processes.

Inventive Principle:
Principle #31Porous materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The engineered pathways reduce intercalation time and ensure uniform doping across large areas, resulting in faster and more efficient conductivity enhancement of graphene sheets.

Implementation Method 1

intercalation doping, which involves the insertion (via diffusion) of certain atoms, ions, or molecules into the host material

Methodology Applied
Scientific EffectDiffusion: Diffusion

Data Source

PatentUS12438089B2Techniques, methods, and structures for rapid and efficient intercalation-doping of large-area multi-layered graphene sheets for transparent conductor applications, including solar cells and displays
Publication Date: 2025.10.07 DESTINATION 2D INC
  • US12438089B2 patent drawing
  • US12438089B2 patent drawing

AI summary

A conducting thin film structure or pattern which facilitates the insertion of dopant atoms, ions, or molecules into layered 2D materials including: a layered 2D material, an electrically isolative material disposed below the layered 2D material, where the layered 2D material has at least one layer, where the layered 2D material includes slots, where the slots include etched regions where the layered 2D material is at least partially etched away, where the etched regions include a width greater than 0.5 nm and less than 1 meter, where the layered 2D material is intercalation doped with at least one dopant, where the at least one dopant includes at least one intercalation doping agent, where the layered 2D material with the slots is fully intercalation doped (stage-1 intercalation) or partially intercalation doped, where a first portion of the layered 2D material is doped p-type, and a second portion is doped n-type.