Etched Mask Design for Uniform Tensile Force in Display Deposition
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Solution Overview
Problem
The existing deposition methods for forming emission layers in organic light emitting display devices face challenges due to mask deformation under tensile force, leading to wrinkles and deterioration in deposition quality.
Innovation Solution
A mask with a sensor area featuring half-etched and deposition areas, including a second deposition area within the sensor area, is designed to minimize surface area and uniform tensile force, reducing mask deformation and improving deposition quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the mask is made extremely thin to achieve precise deposition patterns, then the deposition precision is improved, but the mask becomes prone to deformation and wrinkle formation under tensile force
Solution Approach 1:
The patent changes the physical-chemical parameters of the mask by forming etched areas (first and second etched areas) on opposite surfaces of the mask. These etched areas modify the local mechanical properties and stress distribution, allowing the thin mask to maintain structural stability under tensile force while preserving deposition precision. The etching depth and area are optimized to balance flexibility and rigidity.
Solution Approach 2:
The mask structure becomes composite by combining the base mask material with etched regions that have different mechanical properties. The etched areas create a composite structure where the unetched portions provide strength and the etched portions provide flexibility and stress relief, preventing wrinkle formation while maintaining the thin profile needed for precise deposition.
2Reliability
If tensile force is applied to the mask to ensure proper contact with the mask frame, then the contact quality is improved, but non-uniform tensile force causes wrinkles and deformation
Solution Approach 1:
The patent applies local quality by creating specific etched areas at strategic locations on the mask. These etched areas are positioned to locally adjust the mechanical properties and stress distribution, ensuring that tensile force is distributed more uniformly across the mask surface. This prevents localized wrinkle formation while maintaining overall contact quality with the mask frame.
Solution Approach 2:
The mask is segmented into different functional zones: first etched areas on the first surface, second etched areas on the second surface, and unetched portions. This segmentation allows different regions to serve different purposes - some areas provide attachment points for uniform force distribution, while other areas maintain the precise deposition geometry, resolving the contradiction between contact quality and deposition quality.
3Measurement precision
If the sensor area is enlarged to improve sensing accuracy, then the measurement precision is improved, but the mask surface area increases leading to greater deformation under tensile force
Solution Approach 1:
The patent changes the geometric parameters of the sensor area by forming etched patterns within it. The etched areas modify the local mass distribution and mechanical properties, allowing the sensor area to maintain large surface area for accurate sensing while the etched regions provide stress relief to prevent deformation under tensile force.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed mask design enhances deposition quality by reducing mask deformation and ensuring uniform tensile force, resulting in improved contact between the mask and mask frame, thereby maintaining precise deposition patterns.
Implementation Method 1
Each opening of the first and the second deposition areas may include a first etched area formed by etching the mask in a direction from a first surface of the mask toward a second surface of the mask, and a second etched area formed by etching the mask in a direction from the second surface of the mask toward the first surface of the mask.
Data Source
AI summary
A mask including a sensor area including at least one half-etched area, a first deposition area disposed external to the sensor area, and a second deposition area disposed in the sensor area. The mask, a mask assembly including the mask, a display panel manufacturing apparatus including the mask assembly, and a method of manufacturing a display panel using the display panel manufacturing apparatus in accordance with embodiments of the disclosure may improve deposition quality.