Etching Chamber Cleaning Sequence for Backside Helium Stability
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Solution Overview
Problem
Current preventive maintenance methods for metal etching chambers fail to effectively remove metal particles from the electrostatic chuck and chamber walls, leading to abnormal backside helium flow and increased downtime, which affects production capacity and resource utilization in semiconductor factories.
Innovation Solution
A multi-step cleaning and pumping method using O2 and NF3/Cl2 burning cleaning methods alternately, with specific gas flow and pressure conditions, is applied before opening the chamber for maintenance to remove metal residues from the electrostatic chuck and chamber walls, optimizing the cleaning process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If DI water is used to clean the chamber, then the clean room environment TVOC monitoring is maintained, but the removal effect of metal particles on the ESC and chamber wall is poor
Solution Approach 1:
The patent changes the chemical composition parameters of the cleaning solution by introducing organic solvents (acetone, isopropyl alcohol) in addition to DI water, creating a multi-component cleaning solution that effectively removes metal particles while maintaining TVOC compliance through controlled evaporation and ventilation
Solution Approach 2:
The patent uses a composite cleaning solution comprising multiple components (DI water, acetone, isopropyl alcohol) that work synergistically to remove different types of contaminants, combining the rinsing capability of water with the organic solvent effectiveness for metal particle removal
2Manufacturing precision
If organic solvents are used for cleaning, then the removal effect of metal particles is improved, but TVOC monitoring compliance is violated
Solution Approach 1:
The patent uses organic solvents in controlled partial amounts rather than as the primary cleaning medium, combining them with DI water to achieve effective metal particle removal while limiting the total organic compound concentration to maintain TVOC compliance
Solution Approach 2:
The patent converts the potential harm of organic solvents (TVOC increase) into a benefit by using them in a multi-component solution where they effectively remove metal particles, and then manages the TVOC impact through controlled evaporation and ventilation during the cleaning process
3Ease of operation
If metal particles remain on the ESC surface, then the chamber can be opened for maintenance, but abnormal backside helium flow occurs causing downtime
Solution Approach 1:
The patent performs preliminary cleaning of the ESC surface with the multi-component cleaning solution before opening the chamber for maintenance, removing metal particles in advance to prevent subsequent backside helium flow abnormalities and reduce downtime
Solution Approach 2:
The patent applies preliminary anti-action by removing metal particles from the ESC surface before they can cause backside helium flow disruption, using the cleaning solution to prevent the harmful effect rather than correcting it after occurrence
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method significantly reduces the occurrence of metal particles on the electrostatic chuck, preventing abnormal backside helium flow and ensuring stable production by enhancing the cleaning efficiency before preventive maintenance.
Implementation Method 1
cleaning an electrostatic chuck in the chamber and a chamber wall by using an O2 burning cleaning method
Implementation Method 2
cleaning the electrostatic chuck in the chamber and the chamber wall by using an NF3/Cl2 burning cleaning method
Implementation Method 3
exhausting and pumping down the chamber
Data Source
AI summary
The present application discloses a preventive maintenance method for a chamber of a metal etching machine. An optimized burning cleaning recipe is added before the chamber is opened, and metal substances remaining on the surface of an electrostatic chuck are removed by adopting a cleaning/pumping down multi-step alternate method. Before the chamber is opened for preventive maintenance, the phenomenon of metal particles remaining on the surface of the electrostatic chuck can be significantly improved, thus solving the downtime problem caused by abnormal backside helium and ensuring the stability of mass production.