Etching Device Low-Volatile Liquid Inhibitor Uniformity
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The challenge is to inhibit variations in etching processing while minimizing costs in substrate processing, particularly when using high-volatility organic solvents like isopropyl alcohol, which are difficult to uniformly supply due to their volatility.
Innovation Solution
An etching device that supplies a low-volatile liquid before and during the application of an organic solvent to the process film, reducing solvent volatility and allowing for uniform distribution and reduced usage, thereby maintaining processing uniformity and controlling costs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a large amount of high-volatility organic solvent is supplied to the process film, then uniform etching processing can be achieved, but processing costs significantly increase
Solution Approach 1:
A low-volatility liquid is introduced as an intermediary substance between the high-volatility organic solvent and the process film. This intermediary liquid suppresses the volatility of the organic solvent, allowing it to remain on the process film longer and distribute more uniformly without requiring excessive amounts, thereby reducing solvent consumption while maintaining etching uniformity
Solution Approach 2:
The volatility parameter of the liquid environment is changed by introducing a low-volatility liquid. This parameter change creates a controlled atmosphere that reduces the evaporation rate of the organic solvent, enabling uniform distribution across the process film with reduced solvent quantity
2Ease of manufacture
If a high-volatility organic solvent is supplied to the process film, then etching processing can be performed, but uniform distribution across the film is difficult to achieve
Solution Approach 1:
The low-volatility liquid serves as a mediator that facilitates the uniform distribution of the high-volatility organic solvent. By creating a liquid environment with suppressed volatility, it allows the organic solvent to spread evenly across the process film surface before evaporation occurs, achieving both etching capability and uniform distribution
3Quantity of substance
If the amount of organic solvent is reduced to lower costs, then processing costs decrease, but variations in etching processing increase
Solution Approach 1:
The low-volatility liquid acts as a carrier and volatility suppressor, enabling reduced amounts of organic solvent to be effectively distributed across the entire process film. This intermediary system ensures that even small quantities of organic solvent achieve uniform coverage and consistent etching results, maintaining precision while reducing solvent consumption and cost
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The use of a low-volatile liquid inhibitor allows for uniform etching processing across the substrate, reducing the amount of organic solvent needed and preventing cost increases, while ensuring efficient and consistent etching results.
Implementation Method 1
Because the low-volatile liquid has volatility lower than that of the organic solvent, volatilization of the organic solvent is inhibited by the low-volatile liquid
Data Source
AI summary
During a first period, pure water used as a low-volatile liquid is supplied onto a substrate while the substrate is rotated. After discharge of the low-volatile liquid is stopped, the low-volatile liquid remains in a large region on a DSA film. The low-volatile liquid is held on the DSA film without reacting with the DSA film. During a subsequent second period, an organic solvent is supplied to the substrate while the substrate is rotated. The organic solvent supplied to the substrate is mixed with the low-volatile liquid remaining on the DSA film. In this case, volatilization of the organic solvent is inhibited on the DSA film.