Etching Recipe Prediction Using Position-Optical Data

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Current etching operations in semiconductor manufacturing require multiple actual tests to determine etching endpoint and maintenance time, leading to increased operating steps and testing costs, especially when etching recipes change or new materials are introduced.

Innovation Solution

A method and system that collect historical etching recipes and position-optical measurement values to build a supervised learning model, allowing for the prediction of etching recipes for new products based on input specifications, thereby reducing the need for actual etching tests.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If actual etching tests are conducted to determine etching endpoint and maintenance time, then etching operation reliability is improved, but operating steps and testing costs increase

Engineering Contradiction:
Improveetching operation reliabilityVSAvoidoperating steps and testing costs
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The system performs preliminary actions by collecting historical etching data and building a prediction model in advance. When a new etching recipe is needed, the system can predict the endpoint and maintenance time directly from the model without conducting actual tests, thus maintaining reliability while avoiding time-consuming testing steps

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The system creates a virtual copy of the etching process through data collection and model building. Instead of physically testing each new recipe, the system uses the prediction model to simulate and determine optimal parameters, replacing physical tests with virtual predictions that maintain accuracy while reducing operational overhead

Inventive Principle:
Principle #26Copying

2Manufacturing precision

If multiple actual etching tests are performed to obtain etching endpoint curve, then etching parameter accuracy is improved, but productivity decreases

Engineering Contradiction:
Improveetching parameter accuracyVSAvoidmanufacturing efficiency
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The system performs preliminary data collection and model training using historical etching data from multiple sources. Once the prediction model is established, it can rapidly predict endpoint and maintenance time for new recipes with high accuracy without requiring new physical tests, thus maintaining precision while improving productivity

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The prediction model serves itself by learning from historical data and automatically generating predictions for new etching recipes. The system uses accumulated knowledge to independently determine optimal parameters without requiring external testing interventions, maintaining accuracy while accelerating the recipe development process

Inventive Principle:
Principle #25Self-service

Data Source

PatentUS20240281676A1Method for predicting etching recipe and system thereof
Publication Date: 2024.08.22 UNITED MICROELECTRONICS CORP
  • US20240281676A1 patent drawing
  • US20240281676A1 patent drawing
  • US20240281676A1 patent drawing

AI summary

A method and a system for predicting etching recipe are provided, wherein the method includes steps as follows: Firstly, a plurality of etching recipes of existing etched products and a plurality sets of position-optical measurement values corresponding to the plurality of etching recipes are collected. Then, a supervised learning training is performed according to a plurality of optical measurement values in each set of the position-optical measurement values to build a predicting model. A specification data of a product to be etched including a position-optical parameter is input into this predicting model to obtain a prediction result. Subsequently, according to the prediction result, one of the plurality of etching recipes of the existing etched products is selected as a suggested etching recipe for the product to be etched.