In-Scanner EUV Reticle Backside Cleaning System
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Solution Overview
Problem
The challenge in EUV photolithography is the contamination of reticles by debris particles, which disrupts the photolithography process and requires costly and time-consuming reticle removal for cleaning, leading to inefficiencies and increased risk of damage.
Innovation Solution
A reticle cleaning system is integrated within the scanner environment, allowing for immediate inspection and cleaning of debris particles on the reticle's backside without removing it from the scanner, utilizing a cleaning member and optical measurement system to precisely remove contaminants while maintaining the reticle in a vacuum condition.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If reticle is removed from scanner for cleaning, then cleaning can be performed, but time is lost and risk of damage increases
Solution Approach 1:
The cleaning system is prepared in advance within the scanner environment, allowing immediate cleaning action when debris is detected, eliminating the need to remove the reticle from the scanner and thus preventing time loss and damage risk
Solution Approach 2:
A cleaning member acts as an intermediary substance that contacts and removes debris from the reticle surface through direct interaction, enabling effective cleaning without removing the reticle from its protected environment in the scanner
2Reliability
If reticle is removed from scanner for cleaning, then cleaning can be performed, but risk of damage increases
Solution Approach 1:
The cleaning member serves as a controlled intermediary that safely removes debris without exposing the reticle to external damage risks, as the cleaning process occurs within the protected scanner environment rather than requiring reticle removal
Solution Approach 2:
The scanner maintains a controlled clean environment that protects the reticle from contamination and damage during handling, and the cleaning system operates within this protected atmosphere, eliminating the risks associated with removing the reticle
3Productivity
If cleaning system is integrated within scanner, then reticle availability is improved, but device complexity increases
Solution Approach 1:
The cleaning system is designed to work within the existing scanner infrastructure, utilizing available components and environments to provide cleaning functionality without requiring a completely separate system, thus limiting the increase in overall device complexity
Solution Approach 2:
The cleaning system is activated automatically when debris is detected on the reticle, performing self-service cleaning without requiring manual intervention or complex external control systems, thereby reducing operational complexity while maintaining high productivity
Data Source
AI summary
An extreme ultraviolet (EUV) photolithography system includes a scanner. Photolithography system performs EUV photolithography processes with a reticle in the scanner. The scanner includes a reticle storage chamber, a reticle backside inspection chamber, and a reticle cleaning chamber. The reticle cleaning chamber cleans debris from the backside of the reticle within the scanner.