EUV Light Beam Alignment via Plasma UV Energy Sensors
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Solution Overview
Problem
Existing EUV light source technologies face challenges in accurately aligning an amplified light beam with a target material to optimize plasma production and ultraviolet radiation emission, leading to inefficiencies in EUV light generation for photolithography processes.
Innovation Solution
A system that adjusts the radial alignment of an amplified light beam relative to a target mixture by detecting energy emissions at multiple locations, analyzing the detected energy, and adjusting the position and angle of optical elements to minimize the radial distance between the beam and target, using sensors and a controller to optimize EUV radiation production.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If traditional alignment methods are used for the amplified light beam and target material, then the system structure remains simple, but the alignment precision is insufficient leading to reduced EUV light generation efficiency
Solution Approach 1:
The system performs preliminary alignment actions by detecting UV radiation energy distribution before the main EUV generation process. Energy sensors detect radiation patterns in advance, allowing the control system to adjust optical elements (mirrors, lenses) to optimize beam-target alignment before actual EUV production, preventing misalignment issues from affecting productivity
Solution Approach 2:
The system implements continuous feedback control by monitoring UV radiation energy at multiple locations with energy sensors. The detected energy distribution is fed back to the control system, which automatically adjusts optical elements to maintain optimal alignment between the amplified light beam and target material, ensuring consistent alignment precision throughout operation
2Productivity
If the radial alignment of the amplified light beam is not optimized, then the system operation remains simple, but the EUV light generation efficiency is reduced
Solution Approach 1:
The system performs self-alignment by automatically detecting UV radiation energy distribution and adjusting its own optical elements through feedback control. The control system processes sensor data and autonomously modifies mirror angles and lens positions to optimize beam alignment with the target, eliminating the need for manual alignment operations and enabling the system to maintain optimal productivity independently
Solution Approach 2:
The system optimizes EUV generation efficiency by dynamically changing physical parameters of optical elements, specifically adjusting the angles and positions of mirrors and lenses based on detected UV energy distribution. These parameter adjustments modify the radial alignment of the amplified light beam relative to the target material, maximizing energy coupling and EUV radiation production
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the alignment precision, increasing the efficiency of EUV light generation and improving the production of ultraviolet radiation, thereby supporting more effective photolithography processes.
Implementation Method 1
converting a material into a plasma state that has an element, for example, xenon, lithium, or tin, with an emission line in the EUV range. In one such method, often termed laser produced plasma ('LPP'), the required plasma can be produced by irradiating a target material
Implementation Method 2
the plasma is typically produced in a sealed vessel, for example, a vacuum chamber, and monitored using various types of metrology equipment
Data Source
AI summary
An apparatus includes a drive laser system producing an amplified light beam of pulses that travels along a drive axis; a beam delivery system that directs the amplified light beam of pulses toward a target region; a target material delivery system that provides a target mixture containing a target material in the target region; two or more sensors radially separated from a main axis that crosses the target region, the two or more sensors being configured to detect energy of ultraviolet electromagnetic radiation emitted from a plasma state of the target material when the amplified light beam of pulses intersects the target mixture; and a controller that receives the output from the two or more sensors. The controller is configured to estimate a relative radial alignment between the target mixture and the drive axis within the target region based on an analysis of the detected energy.