EUV Lithography Beam-Forming System Thermal Alignment
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Solution Overview
Problem
EUV lithography apparatuses face challenges in maintaining optimal field and pupil positions during the heating phase, leading to extended downtime when optical units are swapped, as existing methods require dismantling and reinstallation, and adjustments are typically made post-heating phase.
Innovation Solution
A beam-shaping and illumination system with an adjustment device that measures and adjusts the optical element's position and orientation in real-time during the heating phase, allowing for continuous alignment and minimizing downtime by keeping the optical element within target specifications.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If optical units are swapped in EUV lithography apparatus, then the system can maintain operational capability, but the downtime is extended due to dismantling and reinstallation requirements
Solution Approach 1:
The illumination system is divided into multiple interchangeable optical units (first optical unit, second optical unit) that can be independently swapped. Each unit contains complete functional elements (mirrors, beam shaping components), allowing individual replacement without affecting the entire system, thus enabling quick exchange while maintaining operational capability.
Solution Approach 2:
A heating phase is implemented before exposure operation, during which optical units are pre-heated to operational temperature. This preliminary heating stabilizes the optical properties of the units, ensuring that when units are swapped, they are already in their optimal thermal state, reducing the need for re-adjustment and minimizing downtime.
2Adaptability or versatility
If optical units are swapped with dismantling and reinstallation, then unit replacement is possible, but the complexity and time of the swapping process increases
Solution Approach 1:
The system is segmented into modular optical units with standardized interfaces. Each unit can be independently removed and installed, simplifying the swapping process. The modular design with defined connection points (holder, mounting structure) reduces the complexity of dismantling and reinstallation by providing clear, repeatable procedures.
Solution Approach 2:
The system incorporates dynamic adjustment capabilities during the heating phase, where optical elements can be repositioned in real-time. This dynamic adjustment mechanism allows for fine-tuning of optical paths without requiring complete dismantling, reducing swapping complexity while maintaining adaptability.
3Stability of the object's composition
If adjustments are made after the heating phase, then the system reaches thermal stability, but the exposure operation starts later increasing downtime
Solution Approach 1:
The heating phase serves as a preliminary action that prepares the optical units for exposure operation. During this phase, optical elements are heated to operational temperature and preliminary adjustments are made. This ensures that when exposure operation begins, the system is already thermally stabilized, eliminating the need for post-heating adjustments and reducing delay.
Solution Approach 2:
The heating phase and exposure operation are connected continuously without interruption. The optical units are heated and adjusted during the heating phase, and exposure operation begins immediately afterward without cooling down or restarting the heating process. This continuous action maintains thermal stability while minimizing the time delay before exposure operation.
4Loss of time
If optical elements are adjusted during heating phase, then exposure operation can start during heating phase reducing downtime, but the measurement and adjustment process becomes more complex
Solution Approach 1:
A measurement device is integrated into the system to monitor the position and orientation of optical elements during the heating phase. This feedback mechanism provides real-time data on optical element alignment, allowing for precise adjustments to be made while heating is ongoing. The feedback loop ensures that adjustments are made based on actual measured values, reducing downtime while maintaining measurement accuracy through automated monitoring.
Data Source
AI summary
A beam-forming and illuminating system for a lithography system, such an EUV lithography system, includes an optical element and an adjusting device. The adjusting device is configured so that, during a heat-up phase of the beam-forming and illuminating system, the adjusting device measures a field position and/or a pupil position of the beam-forming and illuminating system and adjusts the orientation and/or position of the optical element based on the measured field position and/or pupil position to keep the optical element in a desired position.